Role of Molecular Structure on Modulating the Interfacial Dynamics for Shallow Trench Isolation (STI) Chemical Mechanical Planarization (CMP) Applications
Wortman-Otto, Katherine M., Linhart, Abigail N., Dudek, Abigail L., Sherry, Brian M., Keleher, Jason J.
Published in ECS journal of solid state science and technology (01.02.2021)
Published in ECS journal of solid state science and technology (01.02.2021)
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Journal Article
Probing the Interactions between CeO 2 Nanoparticles and Cleaning Chemistry Relevant to Post STI CMP Cleaning
Zubi, Tala B, Graverson, Carolyn F, Sherry, Brian M, Keleher, Jason J., Dickmann, Dan S, Her, Bob, Urban, Nathaniel D
Published in Meeting abstracts (Electrochemical Society) (13.04.2018)
Published in Meeting abstracts (Electrochemical Society) (13.04.2018)
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Journal Article
Probing Oxide-Nitride Selectivity As a Function of CeO 2 Valence State Relevant to STI CMP
Sherry, Brian M, Wortman-Otto, Katherine M, Mikos, Allie M, Keleher, Jason J., Dickmann, Dan S, Her, Bob, Urban, Nathaniel D
Published in Meeting abstracts (Electrochemical Society) (13.04.2018)
Published in Meeting abstracts (Electrochemical Society) (13.04.2018)
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Journal Article