Substrate bias effects on mechanical and tribological properties of substitutional solid solution (Ti, Al)N films prepared by reactive magnetron sputtering
Chu, K., Shum, P.W., Shen, Y.G.
Published in Materials science & engineering. B, Solid-state materials for advanced technology (01.07.2006)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (01.07.2006)
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XPS study for reactively sputtered titanium nitride thin films deposited under different substrate bias
Jiang, Ning, Zhang, H.J., Bao, S.N., Shen, Y.G., Zhou, Z.F.
Published in Physica. B, Condensed matter (30.10.2004)
Published in Physica. B, Condensed matter (30.10.2004)
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Structural properties and nitrogen-loss characteristics in sputtered tungsten nitride films
Shen, Y.G, Mai, Y.W, McBride, W.E, Zhang, Q.C, McKenzie, D.R
Published in Thin solid films (01.09.2000)
Published in Thin solid films (01.09.2000)
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