Inspection challenges for triple patterning at sub-14 nm nodes with broadband plasma inspection platforms
Halder, Sandip, Truffert, Vincent, van den Heuvel, Dieter, Leray, Philippe, Shaunee Cheng, McIntyre, Greg, Sah, Kaushik, Brown, Jim, Parisi, Paolo, Polli, Marco
Published in 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2015)
Published in 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2015)
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Conference Proceeding
Wafer-based aberration metrology for lithographic systems using overlay measurements on targets imaged from phase-shift gratings
van Haver, Sven, Coene, Wim M J, D'havé, Koen, Geypen, Niels, van Adrichem, Paul, de Winter, Laurens, Janssen, Augustus J E M, Cheng, Shaunee
Published in Applied optics. Optical technology and biomedical optics (20.04.2014)
Published in Applied optics. Optical technology and biomedical optics (20.04.2014)
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Journal Article
Progress in ArF immersion lithography
Ronse, K., Ercken, M., Leunissen, P., Maenhoudt, M., Cheng, S., Vandenberghe, G.
Published in Digest of Papers Microprocesses and Nanotechnology 2005 (2005)
Published in Digest of Papers Microprocesses and Nanotechnology 2005 (2005)
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Conference Proceeding