Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation
Park, Juhae, Lee, Sung-Gyu, Vesters, Yannick, Severi, Joren, Kim, Myungwoong, De Simone, Danilo, Oh, Hye-Keun, Hur, Su-Mi
Published in Polymers (22.11.2019)
Published in Polymers (22.11.2019)
Get full text
Journal Article
e-beam metrology of thin resist for high NA EUVL
Lorusso, Gian Francesco, De Simone, Danilo, Zidan, Mohamed, Severi, Joren, Moussa, Alain, Dey, Bappaditya, Halder, Sandip, Goldenshtein, Alex, Houchens, Kevin, Santoro, Gaetano, Fischer, Daniel, Muellender, Angelika, Mack, Chris, Kondo, Tsuyoshi, Shohjoh, Tomoyasu, Ikota, Masami, Charley, Anne-Laure, De Gendt, Stefan, Leray, Philippe
Published in Japanese Journal of Applied Physics (01.06.2023)
Published in Japanese Journal of Applied Physics (01.06.2023)
Get full text
Journal Article
PATTERN HEIGHT METROLOGY USING AN E-BEAM SYSTEM
Saib, Mohamed, Charley, Anne-Laure, Lorusso, Gian Francesco, Moussa, Alain, De Simone, Danilo, Severi, Joren
Year of Publication 10.04.2024
Get full text
Year of Publication 10.04.2024
Patent
Pattern Height Metrology Using an E-Beam System
Saib, Mohamed, Charley, Anne-Laure, Lorusso, Gian Francesco, Moussa, Alain, De Simone, Danilo, Severi, Joren
Year of Publication 08.12.2022
Get full text
Year of Publication 08.12.2022
Patent
PATTERN HEIGHT METROLOGY USING AN E-BEAM SYSTEM
Saib, Mohamed, Charley, Anne-Laure, Lorusso, Gian Francesco, Moussa, Alain, De Simone, Danilo, Severi, Joren
Year of Publication 07.12.2022
Get full text
Year of Publication 07.12.2022
Patent