Implant anneal using a single-wafer furnace and a lamp-based rapid thermal annealing system
WOO SIK YOO, FUKADA, Takashi, SETOKUBO, Tsuyoshi, AIZAWA, Kazuo, OHSAWA, Toshinori, TAKAHASHI, Nobuaki, ENJOJI, Keiichi
Published in Journal of the Electrochemical Society (01.07.2002)
Published in Journal of the Electrochemical Society (01.07.2002)
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Journal Article
Rapid thermal annealing of arsenic implanted silicon wafers
Woo Sik Yoo, Fukada, T., Setokubo, T., Aizawa, K., Yamamoto, J., Komatsubara, R.
Published in Extended Abstracts of the Second International Workshop on Junction Technology. IWJT. (IEEE Cat.No.01EX541C) (2001)
Published in Extended Abstracts of the Second International Workshop on Junction Technology. IWJT. (IEEE Cat.No.01EX541C) (2001)
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Conference Proceeding
Comparative study on implant anneal using single wafer furnace and lamp-based rapid thermal processor
Woo Sik Yoo, Fukada, T., Setokubo, T., Aizawa, K., Ohsawa, T., Takahashi, N., Komatubara, R.
Published in 9th International Conference on Advanced Thermal Processing of Semiconductors, RTP 2001 (2001)
Published in 9th International Conference on Advanced Thermal Processing of Semiconductors, RTP 2001 (2001)
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Conference Proceeding
Method of forming insulating film improved in electric insulating property
HIROTA, TOSHIYUKI, SETOKUBO, TSUYOSHI, AISO, FUMIKI, FUJIWARA, SYUJI, TAKIMOTO, TOSHIHIDE
Year of Publication 01.12.2004
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Year of Publication 01.12.2004
Patent