SIMS imaging of the nanoworld: applications in science and technology
Senoner, Mathias, Unger, Wolfgang E. S
Published in Journal of analytical atomic spectrometry (01.07.2012)
Published in Journal of analytical atomic spectrometry (01.07.2012)
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Journal Article
Summary of ISO/TC 201 International Standard ISO 18516:2019 Surface chemical analysis—Determination of lateral resolution and sharpness in beam‐based methods with a range from nanometres to micrometres and its implementation for imaging laboratory X‐ray photoelectron spectrometers (XPS)
Unger, Wolfgang E. S., Senoner, Mathias, Stockmann, Jörg M., Fernandez, Vincent, Fairley, Neal, Passiu, Cristiana, Spencer, Nicholas D., Rossi, Antonella
Published in Surface and interface analysis (01.04.2022)
Published in Surface and interface analysis (01.04.2022)
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Journal Article
Advanced thin film technology for ultrahigh resolution X-ray microscopy
Vila-Comamala, Joan, Jefimovs, Konstantins, Raabe, Jörg, Pilvi, Tero, Fink, Rainer H., Senoner, Mathias, Maaßdorf, Andre, Ritala, Mikko, David, Christian
Published in Ultramicroscopy (01.10.2009)
Published in Ultramicroscopy (01.10.2009)
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Journal Article
Imaging surface analysis: Lateral resolution and its relation to contrast and noise
Senoner, Mathias, Wirth, Thomas, Unger, Wolfgang E. S
Published in Journal of analytical atomic spectrometry (01.01.2010)
Published in Journal of analytical atomic spectrometry (01.01.2010)
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Journal Article
Erratum to “advanced thin film technology for ultrahigh resolution X-ray microscopy” [Ultramicroscopy 109 (2009) 1360–1364]
Vila-Comamala, Joan, Jefimovs, Konstantins, Raabe, Jörg, Pilvi, Tero, Fink, Rainer H., Senoner, Mathias, Maaßdorf, Andre, Ritala, Mikko, David, Christian
Published in Ultramicroscopy (2010)
Published in Ultramicroscopy (2010)
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Journal Article
FOTOEMPFAENGER FUER SPEKTROSKOPIE UND FARBMESSUNG
SENONER,MATHIAS,DD, REDLIN,HARALD,DD, VOIGT,JOACHIM,DD, ROSSMANN,HELMUT,DD
Year of Publication 21.10.1981
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Year of Publication 21.10.1981
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