Cleaning and Strip Requirement for Metal Gate Based CMOS Integration
Schram, Tom, Farid, Sebai, Cleas, Martine, Vos, Rita, Wada, Masayuki, Albert, Johan, Rohr, Erika, Kubicek, Stefan
Published in ECS transactions (25.09.2009)
Published in ECS transactions (25.09.2009)
Get full text
Journal Article
Buried Power Rail Integration With FinFETs for Ultimate CMOS Scaling
Gupta, Anshul, Pedreira, Olalla Varela, Arutchelvan, Goutham, Zahedmanesh, Houman, Devriendt, Katia, Mertens, Hans, Tao, Zheng, Ritzenthaler, Romain, Wang, Shouhua, Radisic, Dunja, Kenis, Karine, Teugels, Lieve, Sebai, Farid, Lorant, Christophe, Jourdan, Nicolas, Chan, Boon Teik, Subramanian, Sujith, Schleicher, Filip, Hopf, Toby, Peter, Antony Premkumar, Rassoul, Nouredine, Debruyn, Haroen, Demonie, Ingrid, Siew, Yong Kong, Chiarella, Thomas, Briggs, Basoene, Zhou, Xiuju, Rosseel, Erik, De Keersgieter, An, Capogreco, Elena, Litta, Eugenio Dentoni, Boccardi, Guillaume, Baudot, Sylvain, Mannaert, Geert, Bontemps, Noemie, Sepulveda, A., Mertens, Sofie, Kim, Min-Soo, Dupuy, Emmanuel, Vandersmissen, Kevin, Paolillo, Sara, Yakimets, Dmitry, Chehab, Bilal, Favia, Paola, Drijbooms, Christel, Cousserier, Joris, Jaysankar, Manoj, Lazzarino, Frederic, Morin, Pierre, Altamirano, Efrain, Mitard, Jerome, Wilson, Christopher J., Holsteyns, Frank, Boemmels, Juergen, Demuynck, Steven, Tokei, Zsolt, Horiguchi, Naoto
Published in IEEE transactions on electron devices (01.12.2020)
Published in IEEE transactions on electron devices (01.12.2020)
Get full text
Journal Article
SiGe Selective Etching to Enable Bottom and Middle Dielectric Isolations for Advanced Gate-All-Around FET Architecture
Yusuke, Oniki, Altamirano-Sanchez, Efrain, Ishizu, Takaaki, Sebaai, Farid, Liu, Wen, Wu, Ai Ping, Lai, Ju Geng, Tanaka, Takayoshi, Chen, Jason, Kawashima, Tomohiko, Kawarazaki, Hikaru, Nakano, Teppei
Published in Solid state phenomena (14.08.2023)
Published in Solid state phenomena (14.08.2023)
Get full text
Journal Article
A Low-Power HKMG CMOS Platform Compatible With Dram Node 2× and Beyond
Ritzenthaler, Romain, Schram, Tom, Spessot, Alessio, Caillat, Christian, Aoulaiche, Marc, Moon Ju Cho, Kyoung Bong Noh, Son, Yunik, Hoon Joo Na, Kauerauf, Thomas, Douhard, Bastien, Nazir, Aftab, Soon Aik Chew, Milenin, Alexey P., Altamirano-Sanchez, Efrain, Schoofs, Geert, Albert, Johan, Sebai, Farid, Vecchio, Emma, Paraschiv, Vasile, Vandervorst, Wilfried, Sun-Ghil Lee, Collaert, Nadine, Fazan, Pierre, Horiguchi, Naoto, Thean, Aaron Voon-Yew
Published in IEEE transactions on electron devices (01.08.2014)
Published in IEEE transactions on electron devices (01.08.2014)
Get full text
Journal Article
Cleaning and Strip Requirement for Metal Gate Based CMOS Integration
Schram, Tom, Farid, Sebai, Cleas, Martine, Vos, Rita, Wada, Masayuki, Rohr, Erika, Kubicek, Stefan
Published in Meeting abstracts (Electrochemical Society) (10.07.2009)
Published in Meeting abstracts (Electrochemical Society) (10.07.2009)
Get full text
Journal Article