플라즈마 에칭 반응기 내로 증기 증착 프로세스의 통합
SERINO ANDREW CLARK, CHANDRASEKHARAN RAMESH, NICHOLSON THAD, SCHOEPP ALAN M, HUDSON ERIC A
Year of Publication 20.06.2023
Get full text
Year of Publication 20.06.2023
Patent
CONFIGURABLE LIQUID PRECURSOR VAPORIZER
SCHOEPP ALAN M, TE NIJENHUIS HARALD, LORELLI JEFFREY E, MADRIGAL KEVIN, SUNG EDWARD, SMITH COLIN F, HAMILTON SHAWN M
Year of Publication 22.04.2022
Get full text
Year of Publication 22.04.2022
Patent
콤팩트한 고밀도 플라즈마 소스
SCHOEPP ALAN, PATRICK ROGER, ANDERSON THOMAS W, CHEN LEE, BENJAMIN NEIL M. P, THOMAS CLINT EDWARD, SONG SANG HEON
Year of Publication 09.03.2021
Get full text
Year of Publication 09.03.2021
Patent
ISOTROPIC ATOMIC LAYER ETCH FOR SILICON AND GERMANIUM OXIDES
HEMKER DAVID J, SCHOEPP ALAN M, LILL THORSTEN, SHEN MEIHUA, BERRY III IVAN L
Year of Publication 13.07.2016
Get full text
Year of Publication 13.07.2016
Patent
CONFIGURABLE LIQUID PRECURSOR VAPORIZER
SCHOEPP ALAN M, TE NIJENHUIS HARALD, LORELLI JEFFREY E, MADRIGAL KEVIN, SUNG EDWARD, SMITH COLIN F, HAMILTON SHAWN M
Year of Publication 07.01.2016
Get full text
Year of Publication 07.01.2016
Patent
CONTROLLED AMBIENT SYSTEM FOR INTERFACE ENGINEERING
HOWARD ARTHUR M, DORDI YEZDI, ARUNAGIRI TIRUCHIRAPALLI, MOORING BENJAMIN W, SCHOEPP ALAN, PARKS JOHN, HEMKER DAVID, THIE WILLIAM, REDEKER FRITZ C, BOYD JOHN
Year of Publication 08.01.2014
Get full text
Year of Publication 08.01.2014
Patent
INTEGRATION OF VAPOR DEPOSITION PROCESS INTO PLASMA ETCH REACTOR
Schoepp, Alan M, Hudson, Eric A, Nicholson, Thad, Chandrasekharan, Ramesh, Serino, Andrew Clark
Year of Publication 17.08.2023
Get full text
Year of Publication 17.08.2023
Patent
INTEGRATION OF VAPOR DEPOSITION PROCESS INTO PLASMA ETCH REACTOR
NICHOLSON, Thad, CHANDRASEKHARAN, Ramesh, SERINO, Andrew Clark, HUDSON, Eric A, SCHOEPP, Alan M
Year of Publication 28.04.2022
Get full text
Year of Publication 28.04.2022
Patent