Lithography simulation for the fabrication of silicon photonic devices with deep-ultraviolet lithography
Xu Wang, Wei Shi, Hochberg, M., Adam, K., Schelew, E., Young, J. F., Jaeger, N. A. F., Chrostowski, L.
Published in The 9th International Conference on Group IV Photonics (GFP) (01.08.2012)
Published in The 9th International Conference on Group IV Photonics (GFP) (01.08.2012)
Get full text
Conference Proceeding
Coupling of nanocrystals and photonic crystals for non-linear applications
Young, J. F., Foell, C., Schelew, E., Haijun Qiao
Published in 2011 Numerical Simulation of Optoelectronic Devices (01.09.2011)
Published in 2011 Numerical Simulation of Optoelectronic Devices (01.09.2011)
Get full text
Conference Proceeding