SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
KIKUCHI TSUTOMU, HIGUCHI KOICHI, HAYASHI TOSHIHIDE, SASAHIRA KONOSUKE
Year of Publication 05.04.2018
Get full text
Year of Publication 05.04.2018
Patent
METHOD FOR REMOVING MULTILAYER RESIST AND PLASMA PROCESSING DEVICE
DEMURA KENSUKE, NAKAMURA SATOSHI, SASAHIRA KONOSUKE, MATSUSHIMA DAISUKE
Year of Publication 11.07.2016
Get full text
Year of Publication 11.07.2016
Patent
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
DEMURA KENSUKE, SUZUKI MASAFUMI, SASAHIRA KONOSUKE, MATSUSHIMA DAISUKE
Year of Publication 23.02.2015
Get full text
Year of Publication 23.02.2015
Patent
(Digital Presentation) High-Dose Ion-Implanted Photoresist Stripping Technology Employing High Temperature Single-Wafer SPM System
Sasahira, Konosuke, Nakamura, Satoshi, Hamada, Koichi, Jinbo, Sadayuki, Hattori, Kei
Published in Meeting abstracts (Electrochemical Society) (07.07.2022)
Published in Meeting abstracts (Electrochemical Society) (07.07.2022)
Get full text
Journal Article
TWI655034B
HAYASHI, TOSHIHIDE, HIGUCHI, KOICHI, KIKUCHI, TSUTOMU, SASAHIRA, KONOSUKE
Year of Publication 01.04.2019
Get full text
Year of Publication 01.04.2019
Patent
Substrate processing apparatus and substrate processing method capable of improving the replacement efficiency of replacing a processing liquid on a processed surface of a substrate with a volatile solvent
HAYASHI, TOSHIHIDE, HIGUCHI, KOICHI, KIKUCHI, TSUTOMU, SASAHIRA, KONOSUKE
Year of Publication 01.07.2018
Get full text
Year of Publication 01.07.2018
Patent