Machine-Learning Guided Quantum Chemical and Molecular Dynamics Calculations to Design Novel Hole-Conducting Organic Materials
Antono, Erin, Matsuzawa, Nobuyuki N, Ling, Julia, Saal, James Edward, Arai, Hideyuki, Sasago, Masaru, Fujii, Eiji
Published in The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory (08.10.2020)
Published in The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory (08.10.2020)
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Massive Theoretical Screen of Hole Conducting Organic Materials in the Heteroacene Family by Using a Cloud-Computing Environment
Matsuzawa, Nobuyuki N, Arai, Hideyuki, Sasago, Masaru, Fujii, Eiji, Goldberg, Alexander, Mustard, Thomas J, Kwak, H. Shaun, Giesen, David J, Ranalli, Fabio, Halls, Mathew D
Published in The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory (12.03.2020)
Published in The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory (12.03.2020)
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Computational Lithography for 3-Dimensional Fine Photolithography using Sophisticated Built-in Lens Mask
Osumi, Tomoaki, Misaka, Akio, Sato, Kousuke, Yasuda, Masaaki, Sasago, Masaru, Hirai, Yoshihiko
Published in Journal of Photopolymer Science and Technology (01.01.2021)
Published in Journal of Photopolymer Science and Technology (01.01.2021)
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Synthesis of Poly[N-(1-adamantyl)vinylsulfonamide-c o- 2-(2-methyl)adamantyl methacrylate] for 193 nm Lithography
Fukuhara, Toshiaki, Shibasaki, Yuji, Ando, Shinji, Kishimura, Shinji, Endo, Masayuki, Sasago, Masaru, Ueda, Mitsuru
Published in Macromolecules (19.04.2005)
Published in Macromolecules (19.04.2005)
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Bilayer Resist Method for Room-Temperature Nanoimprint Lithography
Nakamatsu, Ken-ichiro, Watanabe, Keiichiro, Tone, Katsuhiko, Katase, Tetsuya, Hattori, Wataru, Ochiai, Yukinori, Matsuo, Takahiro, Sasago, Masaru, Namatsu, Hideo, Komuro, Masanori, Matsui, Shinji
Published in Japanese Journal of Applied Physics (01.06.2004)
Published in Japanese Journal of Applied Physics (01.06.2004)
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Approach to Next-Generation Optical Lithography
Keisuke Nakazawa, Keisuke Nakazawa, Toshio Onodera, Toshio Onodera, Masaru Sasago, Masaru Sasago
Published in Japanese Journal of Applied Physics (01.05.1999)
Published in Japanese Journal of Applied Physics (01.05.1999)
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De Novo Design of Molecules with Low Hole Reorganization Energy Based on a Quarter-Million Molecule DFT Screen
Marques, Gabriel, Leswing, Karl, Robertson, Tim, Giesen, David, Halls, Mathew D., Goldberg, Alexander, Marshall, Kyle, Staker, Joshua, Morisato, Tsuguo, Maeshima, Hiroyuki, Arai, Hideyuki, Sasago, Masaru, Fujii, Eiji, Matsuzawa, Nobuyuki N.
Published in The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory (26.08.2021)
Published in The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory (26.08.2021)
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Journal Article
De Novo Design of Molecules with Low Hole Reorganization Energy Based on a Quarter-Million Molecule DFT Screen: Part 2
Staker, Joshua, Marshall, Kyle, Leswing, Karl, Robertson, Tim, Halls, Mathew D., Goldberg, Alexander, Morisato, Tsuguo, Maeshima, Hiroyuki, Ando, Tatsuhito, Arai, Hideyuki, Sasago, Masaru, Fujii, Eiji, Matsuzawa, Nobuyuki N.
Published in The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory (01.09.2022)
Published in The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory (01.09.2022)
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Journal Article
Dissolution Characteristics of Acidic Groups for 157-nm Resist
Kishimura, Shinji, Endo, Masayuki, Sasago, Masaru
Published in Journal of Photopolymer Science and Technology (01.01.2002)
Published in Journal of Photopolymer Science and Technology (01.01.2002)
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Journal Article
Estimation of electron and hole mobility of 50 homogeneous fullerene amorphous structures (C60, C58B2, C58N2 and C58NB) using a percolation corrected Marcus theory model
Goldberg, Alexander, Kwak, H. Shaun, Halls, Mathew D., Matsuzawa, Nobuyuki N., Sasago, Masaru, Arai, Hideyuki, Fujii, Eiji
Published in Organic electronics (01.03.2020)
Published in Organic electronics (01.03.2020)
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Journal Article
Design Concepts of Single-Layer Resists for Vacuum Ultraviolet Lithography
Kishimura, Shinji, Katsuyama, Akiko, Sasago, Masaru, Shirai, Masamitsu, Tsunooka, Masahiro
Published in Japanese Journal of Applied Physics (01.12.1999)
Published in Japanese Journal of Applied Physics (01.12.1999)
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Novel silicon-containing negative resist for bilayer application in electron beam direct writing
HASHIMOTO, K, ENDO, M, SASAGO, M
Published in JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP (01.07.1993)
Published in JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP (01.07.1993)
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Measurement of Resist Transmittance at Extreme Ultraviolet Wavelength Using the Extreme Ultraviolet Reflectometer
Irie, Shigeo, Endo, Masayuki, Sasago, Masaru, Kandaka, Noriaki, Kondo, Hiroyuki, Murakami, Katsuhiko
Published in Japanese Journal of Applied Physics (2002)
Published in Japanese Journal of Applied Physics (2002)
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