High yielding self-aligned contact process for a 0.150-mum DRAM technology
Rupp, T S, Dobuzinsky, D, Sardesai, V Y, Liu, Hang-Yip, Maldei, M, Faltermeier, J, Gambino, J
Published in IEEE transactions on semiconductor manufacturing (01.05.2002)
Published in IEEE transactions on semiconductor manufacturing (01.05.2002)
Get full text
Journal Article
High yielding self-aligned contact process for a 0.150-μm DRAM technology
RUPP, Thomas S, DOBUZINSKY, David, ZHIJIAN LU, SARDESAI, Viraj Y, LIU, Hang-Yip, MALDEI, Michael, FALTERMEIER, John, GAMBINO, Jeff
Published in IEEE transactions on semiconductor manufacturing (01.05.2002)
Published in IEEE transactions on semiconductor manufacturing (01.05.2002)
Get full text
Journal Article