HF Vapor Release Assessment to Address NEMS Applications
Lachal, Laurent, Auclair, Sylvain, Lavios, Pascal, Finet, Jean-Marc, Assidi, Roselyne, Klein, M., Delaguillaumie, F., Marcoux, C., Andreucci, P., Grange, H., Berthelot, A., Santanta, R. Garcia, Lajoinie, E., Louveau, O., Chiaroni, J.
Published in Meeting abstracts (Electrochemical Society) (29.08.2008)
Published in Meeting abstracts (Electrochemical Society) (29.08.2008)
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