Role of Precursor Choice on Area-Selective Atomic Layer Deposition
Oh, Il-Kwon, Sandoval, Tania E, Liu, Tzu-Ling, Richey, Nathaniel E, Bent, Stacey F
Published in Chemistry of materials (08.06.2021)
Published in Chemistry of materials (08.06.2021)
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Journal Article
Effect of Heteroaromaticity on Adsorption of Pyrazine on the Ge(100)‑2×1 Surface
Sandoval, Tania E, Pieck, Fabian, Tonner, Ralf, Bent, Stacey F
Published in Journal of physical chemistry. C (08.10.2020)
Published in Journal of physical chemistry. C (08.10.2020)
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Journal Article
Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3 with a Series of Al(CH3)xCl3-x and Al(CyH2y+1)3 Precursors
Oh, Il-Kwon, Sandoval, Tania E, Liu, Tzu-Ling, Richey, Nathaniel E, Nguyen, Chi Thang, Gu, Bonwook, Lee, Han-Bo-Ram, Tonner-Zech, Ralf, Bent, Stacey F
Published in Journal of the American Chemical Society (06.07.2022)
Published in Journal of the American Chemical Society (06.07.2022)
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Journal Article
Mechanism of Precursor Blocking by Acetylacetone Inhibitor Molecules during Area-Selective Atomic Layer Deposition of SiO2
Merkx, Marc J. M, Sandoval, Tania E, Hausmann, Dennis M, Kessels, Wilhelmus M. M, Mackus, Adriaan J. M
Published in Chemistry of materials (28.04.2020)
Published in Chemistry of materials (28.04.2020)
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Journal Article
Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors
Merkx, Marc J. M, Angelidis, Athanasios, Mameli, Alfredo, Li, Jun, Lemaire, Paul C, Sharma, Kashish, Hausmann, Dennis M, Kessels, Wilhelmus M. M, Sandoval, Tania E, Mackus, Adriaan J. M
Published in Journal of physical chemistry. C (17.03.2022)
Published in Journal of physical chemistry. C (17.03.2022)
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Journal Article
Photoactivated Molecular Layer Deposition through Iodo−Ene Coupling Chemistry
Lillethorup, Mie, Bergsman, David S, Sandoval, Tania E, Bent, Stacey F
Published in Chemistry of materials (12.12.2017)
Published in Chemistry of materials (12.12.2017)
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Journal Article
Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al 2 O 3 with a Series of Al(CH 3 ) x Cl 3- x and Al(C y H 2 y +1 ) 3 Precursors
Oh, Il-Kwon, Sandoval, Tania E, Liu, Tzu-Ling, Richey, Nathaniel E, Nguyen, Chi Thang, Gu, Bonwook, Lee, Han-Bo-Ram, Tonner-Zech, Ralf, Bent, Stacey F
Published in Journal of the American Chemical Society (06.07.2022)
Published in Journal of the American Chemical Society (06.07.2022)
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Journal Article
In situ formation of inhibitor species through catalytic surface reactions during area-selective atomic layer deposition of TaN
Merkx, Marc J. M., Tezsevin, Ilker, Yu, Pengmei, Janssen, Thijs, Heinemans, Rik H. G. M., Lengers, Rik J., Chen, Jiun-Ruey, Jezewski, Christopher J., Clendenning, Scott B., Kessels, Wilhelmus M. M., Sandoval, Tania E., Mackus, Adriaan J. M.
Published in The Journal of chemical physics (28.05.2024)
Published in The Journal of chemical physics (28.05.2024)
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Journal Article
Effect of the ethoxy groups distribution on the phase behaviour of the binary systems carbon dioxide CO2 with industrial non-ionic surfactants (CiEOj)
Sandoval, Tania E., Gárate, M. Pilar, Scavia, J., Florusse, Louw J., Peters, Cor J.
Published in The Journal of chemical thermodynamics (01.02.2013)
Published in The Journal of chemical thermodynamics (01.02.2013)
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Journal Article
Study of the size and morphology of aggregates formed by pentaethylene glycol monooctyl ether (C8EO5) in n-heptane
Sandoval, Tania E., Espinoza, Luis J., Guerra, Ignacio A., Olea, Andrés F., Gárate, María P.
Published in Colloids and surfaces. A, Physicochemical and engineering aspects (20.03.2012)
Published in Colloids and surfaces. A, Physicochemical and engineering aspects (20.03.2012)
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Journal Article
Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation
Yu, Pengmei, Merkx, Marc J.M., Tezsevin, Ilker, Lemaire, Paul C., Hausmann, Dennis M., Sandoval, Tania E., Kessels, Wilhelmus M.M., Mackus, Adriaan J.M.
Published in Applied surface science (30.08.2024)
Published in Applied surface science (30.08.2024)
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Journal Article
Mechanism of Precursor Blocking by Acetylacetone Inhibitor Molecules during Area-Selective Atomic Layer Deposition of SiO 2
Merkx, Marc J. M., Sandoval, Tania E., Hausmann, Dennis M., Kessels, Wilhelmus M. M., Mackus, Adriaan J. M.
Published in Chemistry of materials (28.04.2020)
Published in Chemistry of materials (28.04.2020)
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Journal Article
Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3 with a Series of Al(CH3) x Cl3–x and Al(C y H2y+1)3 Precursors
Oh, Il-Kwon, Sandoval, Tania E., Liu, Tzu-Ling, Richey, Nathaniel E., Nguyen, Chi Thang, Gu, Bonwook, Lee, Han-Bo-Ram, Tonner-Zech, Ralf, Bent, Stacey F.
Published in Journal of the American Chemical Society (06.07.2022)
Published in Journal of the American Chemical Society (06.07.2022)
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Journal Article