Low Temperature Curable Photo-sensitive Insulator
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Published in Journal of Photopolymer Science and Technology (01.01.2014)
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Year of Publication 24.11.2017
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PROCESS FOR FORMING RESIST PATTERN
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Year of Publication 22.11.2017
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RESIN COMPOSITION, POLYMER, CURED FILM AND ELECTRONIC COMPONENT
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Year of Publication 20.02.2014
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Year of Publication 20.02.2014
Patent
RESIN COMPOSITION, POLYMER, CURED FILM AND ELECTRONIC COMPONENT
HANAMURA MASAAKI, YAMATO FUTOSHI, SHIMOYAMA YUUJI, SAKO AKARI, MUKAWA JUN, HIRO AKITO, MIZUNO HIKARU, SAKURAI TOMOHIKO
Year of Publication 15.01.2013
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Year of Publication 15.01.2013
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Resist pattern-forming method
Nakashima, Hiromitsu, Sakurai, Tomohiko, Oosawa, Sousuke, Terayama, Kousuke
Year of Publication 18.02.2020
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Year of Publication 18.02.2020
Patent
Novel low temperature curable photo-sensitive insulator
Sakurai, Tomohiko, Mizuno, Hikaru, Okamoto, Kenji, Inomata, Katsumi
Published in 2014 International Conference on Electronics Packaging (ICEP) (01.04.2014)
Published in 2014 International Conference on Electronics Packaging (ICEP) (01.04.2014)
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Conference Proceeding
Novel low temperature curable photo-sensitive insulator
Okamoto, Kenji, Mizuno, Hikaru, Sakurai, Tomohiko, Inomata, Katsumi
Published in 2014 IEEE 64th Electronic Components and Technology Conference (ECTC) (01.05.2014)
Published in 2014 IEEE 64th Electronic Components and Technology Conference (ECTC) (01.05.2014)
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Conference Proceeding