Damage depth profiles in ion-implanted silicon by the photoacoustic displacement technique
HARA, T, MURAKI, T, SAKURAI, M, TAKEDA, S
Published in Japanese Journal of Applied Physics (01.06.1993)
Published in Japanese Journal of Applied Physics (01.06.1993)
Get full text
Journal Article
Characterization of nitrogen species incorporated into graphite using low energy nitrogen ion sputtering
Kiuchi, Hisao, Kondo, Takahiro, Sakurai, Masataka, Guo, Donghui, Nakamura, Junji, Niwa, Hideharu, Miyawaki, Jun, Kawai, Maki, Oshima, Masaharu, Harada, Yoshihisa
Published in Physical chemistry chemical physics : PCCP (2016)
Published in Physical chemistry chemical physics : PCCP (2016)
Get full text
Journal Article
Characterization of nitrogen species incorporated into graphite using low energy nitrogen ion sputteringElectronic supplementary information (ESI) available. See DOI: 10.1039/c5cp02305j
Kiuchi, Hisao, Kondo, Takahiro, Sakurai, Masataka, Guo, Donghui, Nakamura, Junji, Niwa, Hideharu, Miyawaki, Jun, Kawai, Maki, Oshima, Masaharu, Harada, Yoshihisa
Year of Publication 17.12.2015
Year of Publication 17.12.2015
Get full text
Journal Article
RECORDING HEAD, AND RECORDING DEVICE
UMEDA KENGO, SUGANO HIDEO, KASAI RYO, KAZU HIDENORI, SAKURAI MASATAKA
Year of Publication 19.07.2018
Get full text
Year of Publication 19.07.2018
Patent