Resolution, Line-Edge Roughness, Sensitivity Tradeoff, and Quantum Yield of High Photo Acid Generator Resists for Extreme Ultraviolet Lithography
Higgins, Craig D, Szmanda, Charles R, Antohe, Alin, Denbeaux, Greg, Georger, Jacque, Brainard, Robert L
Published in Japanese Journal of Applied Physics (01.03.2011)
Published in Japanese Journal of Applied Physics (01.03.2011)
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Programmable polymer thin film and non-volatile memory device
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Published in Nature materials (01.12.2004)
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A model of self-limiting residual acid diffusion for pattern doubling
Fuhrmann, Jürgen, Fiebach, André, Uhle, Manfred, Erdmann, Andreas, Szmanda, Charles R., Truong, Chi
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Published in Microelectronic engineering (01.04.2009)
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Conference Proceeding
Resolution, Line-Edge Roughness, Sensitivity Tradeoff, and Quantum Yield of High Photo Acid Generator Resists for Extreme Ultraviolet Lithography
Higgins, Craig D., Szmanda, Charles R., Antohe, Alin, Denbeaux, Greg, Georger, Jacque, Brainard, Robert L.
Published in Japanese Journal of Applied Physics (01.03.2011)
Published in Japanese Journal of Applied Physics (01.03.2011)
Get full text
Journal Article