Mass Spectrometry, Optical Emission Spectroscopy, and Atomic Force Microscopy Studies of Si Etch Characteristics in a Cl 2 Plasma Generated by an Electron Cyclotron Resonance Source
Kuo-Tung Sung, Kuo-Tung Sung, Stella W. Pang, Stella W. Pang
Published in Japanese Journal of Applied Physics (01.12.1994)
Published in Japanese Journal of Applied Physics (01.12.1994)
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Journal Article
Cascode CMOS structure
Hsueh Fu-Lung, Chuang Harry-Hak-Lay, Peng Yung-Chow, Chao Chih-Ping, Jou Chewn-Pu, Sung Kuo-Tung
Year of Publication 28.03.2017
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Year of Publication 28.03.2017
Patent