METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING UNIFIED OPTICAL PROXIMITY CORRECTION
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Year of Publication 27.10.2011
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Year of Publication 27.10.2011
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METHOD OF ETCH PROXIMITY CORRECTION, METHOD OF CREATING PHOTOMASK LAYOUT USING THE SAME, COMPUTER READABLE MEDIA INCLUDING A SEQUENCE OF PROGRAMMED INSTRUCTIONS STORED THEREON FOR IMPLEMENTING THE SAME AND MASK IMAGING SYSTEM
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Year of Publication 19.09.2011
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Method of manufacturing semiconductor device by using uniform optical proximity correction
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Year of Publication 05.03.2013
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Year of Publication 05.03.2013
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METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING UNIFORM OPTICAL PROXIMITY CORRECTION
CHOI SEONG-WOON, SER JUNG-HOON, KIM SANG-WOOK, SUH CHUN-SUK, JEONG MOON-GYU, SHIM SEONG-BO
Year of Publication 27.10.2011
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Year of Publication 27.10.2011
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METHOD OF PERFORMING ETCH PROXIMITY CORRECTION, METHOD OF FORMING PHOTOMASK LAYOUT USING THE METHOD, COMPUTER-READABLE RECORDING MEDIUM STORING PROGRAMMED INSTRUCTIONS FOR EXECUTING THE METHOD, AND MASK IMAGING SYSTEM
CHOI SEONG-WOON, KIM SANG-WOOK, LEE SUNG-WOO, SUH CHUN-SUK, SHIM SEONG-BO
Year of Publication 15.09.2011
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Year of Publication 15.09.2011
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METHOD OF MANUFACTURING A PATTERN STRUCTURE AND METHOD OF MANUFACTURING A TRENCH USING THE SAME
KIM, HAK, BAEK, KYOUNG YUN, SUH, CHUN SUK, YOU, JI YONG, KIM, DAE JOUNG
Year of Publication 11.01.2007
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Year of Publication 11.01.2007
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