OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD FOR TREATING SUCH AN OPTICAL ELEMENT
BEKMAN HERMANUS HENDRICUS PETRUS THEODORUS, EHM DIRK HEINRICH, KUZNETSOV ALEXEY, HUIJBREGTSE JEROEN, STORM ARNOLDUS JAN, AMENT IRENE, GRABER TINA, SMEETS DRIES, TE SLIGTE EDWIN
Year of Publication 23.11.2015
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Year of Publication 23.11.2015
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METHOD FOR DETERMINING A PEPTIDE FINGERPRINT OF A TARGET PROTEIN
VAN DEN EERENBEEMD, Jacobus Maria Antonius, LIEBIG, Thomas, STORM, Arnoldus Jan, CONSTANDSE, Tom Constant
Year of Publication 19.08.2020
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Year of Publication 19.08.2020
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Verfahren zum Analysieren von Kontaminationen
Ehm, Dirk, Storm, Arnoldus Jan, De Jong, Anthonius Martinus Cornelis Petrus
Year of Publication 04.01.2024
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Year of Publication 04.01.2024
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Optical element and optical system for EUV lithography, and method for treating such an optical element
Huijbregtse, Jeroen, Te Sligte, Edwin, Storm, Arnoldus Jan, Graber, Tina, Bekman, Hermanus Hendricus Petrus Theodorus, Ehm, Dirk Heinrich, Ament, Irene, Smeets, Dries, Kuznetsov, Alexey
Year of Publication 23.06.2020
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Year of Publication 23.06.2020
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OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD FOR TREATING SUCH AN OPTICAL ELEMENT
BEKMAN HERMANUS HENDRICUS PETRUS THEODORUS, EHM DIRK HEINRICH, KUZNETSOV ALEXEY, HUIJBREGTSE JEROEN, STORM ARNOLDUS JAN, AMENT IRENE, GRABER TINA, SMEETS DRIES, TE SLIGTE EDWIN
Year of Publication 30.06.2016
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Year of Publication 30.06.2016
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Optical element and optical system for EUV lithography, and method for treating such an optical element
BEKMAN HERMANUS HENDRICUS PETRUS THEODORUS, EHM DIRK HEINRICH, KUZNETSOV ALEXEY, HUIJBREGTSE JEROEN, STORM ARNOLDUS JAN, AMENT IRENE, GRABER TINA, SMEETS DRIES, TE SLIGTE EDWIN
Year of Publication 18.11.2015
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Year of Publication 18.11.2015
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METHOD FOR OPTIMIZING A PROTECTIVE LAYER SYSTEM FOR AN OPTICAL ELEMENT, OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY
STORM, ARNOLDUS, JAN, GRABER, TINA, TE SLIGTE, EDWIN, BEKMANN, HERMANUS, HENDRICUS, PETRUS, THEODORUS, EHM, DIRK, HEINRICH, HUIJBREGTSE, JEROEN
Year of Publication 29.08.2013
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Year of Publication 29.08.2013
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OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD FOR TREATING SUCH AN OPTICAL ELEMENT
KUZNETSOV, ALEXEY, BEKMAN, HERMANUS HENDRICUS PETRUS THEODORUS, GRABER, TINA, TE SLIGTE, EDWIN, STORM, ARNOLDUS JAN, EHM, DIRK HEINRICH, HUIJBREGTSE, JEROEN, AMENT, IRENE, SMEETSIES
Year of Publication 18.09.2014
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Year of Publication 18.09.2014
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Projektionsbelichtungsanlage mit Sensoreinheit zur Partikeldetektion
Schmidt, Stefan-Wolfgang, Storm, Arnoldus Jan, Ehm, Dirk Heinrich, Williams-Peters, Alisia, Logtenberg, Hella
Year of Publication 19.10.2017
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Year of Publication 19.10.2017
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PROJECTION EXPOSURE SYSTEM HAVING A SENSOR UNIT FOR DETECTING PARTICLES
EHM, Dirk, Heinrich, WILLEMS-PETERS, Alisia, SCHMIDT, Stefan-Wolfgang, STORM, Arnoldus, Jan, LOGTENBERG, Hella
Year of Publication 19.10.2017
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Year of Publication 19.10.2017
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Particle cleaning of optical elements for microlithography
SCACCABAROZZI LUIGI, NAGEL MONA, EHM DIRK HEINRICH, VAN DER DONCK JACQUES COR JOHAN, STORM ARNOLDUS JAN, MOORS JOHANNES HUBERTUS JOSEPHINA, STORTELDER JETSKE KARINA, CABALLERO MARIA ISABEL CATALINA, CZAP ALMUT, SANDTKE MARIJN
Year of Publication 02.07.2013
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Year of Publication 02.07.2013
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