Electromigration in AlCu lines: comparison of Dual Damascene and metal reactive ion etching
Filippi, R.G, Gribelyuk, M.A, Joseph, T, Kane, T, Sullivan, T.D, Clevenger, L.A, Costrini, G, Gambino, J, Iggulden, R.C, Kiewra, E.W, Ning, X.J, Ravikumar, R, Schnabel, R.F, Stojakovic, G, Weber, S.J, Gignac, L.M, Hu, C.-K, Rath, D.L, Rodbell, K.P
Published in Thin solid films (01.06.2001)
Published in Thin solid films (01.06.2001)
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Journal Article
Bevel RIE application to reduce defectivity in copper BEOL processing
Bunke, C., Houghton, T., Bandy, K., Stojakovic, G., Fang, G.
Published in 2012 SEMI Advanced Semiconductor Manufacturing Conference (01.05.2012)
Published in 2012 SEMI Advanced Semiconductor Manufacturing Conference (01.05.2012)
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Conference Proceeding
W/WN/poly gate implementation for sub-130 nm vertical cell DRAM
Malik, R., Clevenger, L., McStay, I., Gluschenkov, O., Robl, W., Shafer, P., Stojakovic, G., Yan, W., Naeem, M., Ramachandran, R., Wong, K., Prakash, J., Kang, W., Li, Y., Vollertsen, R., Strong, A., Bergner, W., Divakaruni, R., Bronner, G.
Published in 2001 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.01 CH37184) (2001)
Published in 2001 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.01 CH37184) (2001)
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Conference Proceeding
Challenges of aluminum RIE technology at sub 0.45 μm pitches
RAVIKUMAR, R, FILIPPI, R. G, RATH, D. L, STOJAKOVIC, G, WEBER, S. J, IGGULDEN, R. C, KIEWRA, E. W, KIRIHATA, T, KITAHARA, H, LEE, G. Y, LIEGL, B, MATSUNAGA, T, NING, X. J
Year of Publication 1999
Year of Publication 1999
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Conference Proceeding
Influence of sidewall roughness on the reliability of 0.20-μm AI RIE wiring
RAVIKUMAR, R, CICHY, H, FILIPPI, R. G, KIEWRA, E. W, RATH, D. L, STOJAKOVIC, G
Year of Publication 1999
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Year of Publication 1999
Conference Proceeding
Influence of sidewall roughness on the reliability of 0.20-/spl mu/m Al RIE wiring
Ravikumar, R., Cichy, H., Filippi, R.G., Kiewra, E.W., Rath, D.L., Stojakovic, G.
Published in Proceedings of the IEEE 1999 International Interconnect Technology Conference (Cat. No.99EX247) (1999)
Published in Proceedings of the IEEE 1999 International Interconnect Technology Conference (Cat. No.99EX247) (1999)
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Conference Proceeding
Al deposition temperature process window for 0.20 μm Al RIE interconnections
CLEVENGER, L. A, HONDA, M, RAVIKUMAR, R, STOJAKOVIC, G, DEHAVEN, P, DZIOBKOWSKI, C, GRIBELYUK, M. A, MURPHY, R, WONG, K
Year of Publication 1999
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Year of Publication 1999
Conference Proceeding
Challenges of aluminum RIE technology at sub 0.45 /spl mu/m pitches [DRAM interconnects]
Ravikumar, R., Filippi, R.G., Iggulden, R.C., Kiewra, E.W., Kirihata, T., Kitahara, H., Lee, G.Y., Liegl, B., Matsunaga, T., Ning, X.J., Rath, D.L., Stojakovic, G., Weber, S.J.
Published in Proceedings of the IEEE 1999 International Interconnect Technology Conference (Cat. No.99EX247) (1999)
Published in Proceedings of the IEEE 1999 International Interconnect Technology Conference (Cat. No.99EX247) (1999)
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Conference Proceeding
A highly manufacturable 110 nm DRAM technology with 8F/sup 2/ vertical transistor cell for 1Gb and beyond
Akatsu, H., Weis, R., Cheng, K., Seitz, M., Kim, M.-S., Ramachandran, R., Dyer, T., Kim, B., Kim, D.-K., Malik, R., Strane, J., Goebel, T., Kwon, O.-J., Sung, C.Y., Parkinson, P., Wilson, K., McStay, I., Chudzik, M., Dobuzinsky, D., Jacunski, M., Ransom, C., Settlemyer, K., Economikos, L., Simpson, A., Knorr, A., Naeem, M., Stojakovic, G., Robl, W., Gluschenkov, O., Liegl, B., Wu, C.-H., Wu, Q., Li, W.-K., Choi, C.J., Arnold, N., Joseph, T., Varn, K., Weybright, M., McStay, K., Kang, W.-T., Li, Y., Bukofsky, S., Jammy, R., Schutz, R., Gutmann, A., Bergner, W., Divakaruni, R., Back, D., Crabbe, E., Mueller, W., Bronner, G.
Published in 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) (2002)
Published in 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) (2002)
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Conference Proceeding
A highly manufacturable 110nm DRAM technology with 8F2 vertical transistor cell for 1Gb and beyond
AKATSU, H, WEIS, R, STRANE, J, GOEBEL, T, KWON, O.-J, SUNG, C. Y, PARKINSON, P, WILSON, K, MCSTAY, I, CHUDZIK, M, DOBUZINSKY, D, JACUNSKI, M, CHENG, K, RANSOM, C, SETTLEMYER, K, ECONOMIKOS, L, SIMPSON, A, KNORR, A, NAEEM, M, STOJAKOVIC, G, ROBL, W, GLUSCHENKOV, O, LIEGL, B, SEITZ, M, WU, C.-H, WU, Q, LI, W.-K, CHOI, C. J, ARNOLD, N, JOSEPH, T, VARN, K, WEYBRIGHT, M, MCSTAY, K, KANG, W.-T, KIM, M-S, LI, Y, BUKOFSKY, S, JAMMY, R, SCHUTZ, R, GUTMANN, A, BERGNER, W, DIVAKARUNI, R, BACK, D, CRABBE, E, MUELLER, W, RAMACHANDRAN, R, BRONNER, G, DYER, T, KIM, B, KIM, D.-K, MALIK, R
Year of Publication 2002
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Year of Publication 2002
Conference Proceeding