Factors Controlling Sediment and Phosphorus Export from Two Belgian Agricultural Catchments
Steegen, A., Govers, G., Takken, I., Nachtergaele, J., Poesen, J., Merckx, R.
Published in Journal of environmental quality (01.07.2001)
Published in Journal of environmental quality (01.07.2001)
Get full text
Journal Article
The value of a physically based model versus an empirical approach in the prediction of ephemeral gully erosion for loess-derived soils
Nachtergaele, Jeroen, Poesen, J, Steegen, A, Takken, I, Beuselinck, L, Vandekerckhove, L, Govers, G
Published in Geomorphology (Amsterdam, Netherlands) (01.10.2001)
Published in Geomorphology (Amsterdam, Netherlands) (01.10.2001)
Get full text
Journal Article
Holisitic device exploration for 7nm node
Raghavan, P., Bardon, M. Garcia, Jang, D., Schuddinck, P., Yakimets, D., Ryckaert, J., Mercha, A., Horiguchi, N., Collaert, N., Mocuta, A., Mocuta, D., Tokei, Z., Verkest, D., Thean, A., Steegen, A.
Published in 2015 IEEE Custom Integrated Circuits Conference (CICC) (01.09.2015)
Published in 2015 IEEE Custom Integrated Circuits Conference (CICC) (01.09.2015)
Get full text
Conference Proceeding
Spatially distributed data for erosion model calibration and validation: The Ganspoel and Kinderveld datasets
Van Oost, K., Govers, G., Cerdan, O., Thauré, D., Van Rompaey, A., Steegen, A., Nachtergaele, J., Takken, I., Poesen, J.
Published in Catena (Giessen) (30.06.2005)
Published in Catena (Giessen) (30.06.2005)
Get full text
Journal Article
Conference Proceeding
Strained Si CMOS (SS CMOS) technology: opportunities and challenges
Rim, K., Anderson, R., Boyd, D., Cardone, F., Chan, K., Chen, H., Christansen, S., Chu, J., Jenkins, K., Kanarsky, T., Koester, S., Lee, B.H., Lee, K., Mazzeo, V., Mocuta, A., Mocuta, D., Mooney, P.M., Oldiges, P., Ott, J., Ronsheim, P., Roy, R., Steegen, A., Yang, M., Zhu, H., Ieong, M., Wong, H.-S.P.
Published in Solid-state electronics (01.07.2003)
Published in Solid-state electronics (01.07.2003)
Get full text
Journal Article
The prediction of runoff flow directions on tilled fields
Takken, Ingrid, Govers, Gerard, Steegen, An, Nachtergaele, Jeroen, Guérif, Jérome
Published in Journal of hydrology (Amsterdam) (15.07.2001)
Published in Journal of hydrology (Amsterdam) (15.07.2001)
Get full text
Journal Article
Sediment transport by overland flow over an area of net deposition
Beuselinck, L., Govers, G., Steegen, A., Quine, T. A.
Published in Hydrological processes (15.12.1999)
Published in Hydrological processes (15.12.1999)
Get full text
Journal Article
Dual workfunction fully silicided metal gates
Cabral, C., Kedzierski, J., Linder, B., Zafar, S., Narayanan, V., Fang, S., Steegen, A., Kozlowski, P., Carruthers, R., Jammy, R.
Published in Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004 (2004)
Published in Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004 (2004)
Get full text
Conference Proceeding
Evaluation of the simple settling theory for predicting sediment deposition by overland flow
Beuselinck, L., Govers, G., Steegen, A., Hairsine, P. B., Poesen, J.
Published in Earth surface processes and landforms (01.10.1999)
Published in Earth surface processes and landforms (01.10.1999)
Get full text
Journal Article
Study of CoSi2 formation from a Co-Ni alloy
CHAMIRIAN, O, STEEGEN, A, BENDERA, H, LAUWERSA, A, DE POTTER, M, MARABELLIB, F, MAEX, K
Published in Microelectronic engineering (2002)
Published in Microelectronic engineering (2002)
Get full text
Conference Proceeding
Journal Article
Extreme scaling enabled by 5 tracks cells: Holistic design-device co-optimization for FinFETs and lateral nanowires
Bardon, M. Garcia, Sherazi, Y., Schuddinck, P., Jang, D., Yakimets, D., Debacker, P., Baert, R., Mertens, H., Badaroglu, M., Mocuta, A., Horiguchi, N., Mocuta, D., Raghavan, P., Ryckaert, J., Spessot, A., Verkest, D., Steegen, A.
Published in 2016 IEEE International Electron Devices Meeting (IEDM) (01.12.2016)
Published in 2016 IEEE International Electron Devices Meeting (IEDM) (01.12.2016)
Get full text
Conference Proceeding
BTI reliability of advanced gate stacks for Beyond-Silicon devices: Challenges and opportunities
Groeseneken, G., Franco, J., Cho, M., Kaczer, B., Toledano-Luque, M., Roussel, Ph, Kauerauf, T., Alian, A., Mitard, J., Arimura, H., Lin, D., Waldron, N., Sioncke, S., Witters, L., Mertens, H., Ragnarsson, L.-A, Heyns, M., Collaert, N., Thean, A., Steegen, A.
Published in 2014 IEEE International Electron Devices Meeting (20.02.2015)
Published in 2014 IEEE International Electron Devices Meeting (20.02.2015)
Get full text
Conference Proceeding
Dual work function metal gate CMOS using CVD metal electrodes
Narayanan, V., Callegari, A., McFeely, F.R., Nakamura, K., Jamison, P., Zafar, S., Cartier, E., Steegen, A., Ku, V., Nguyen, P., Milkove, K., Cabral, C., Gribelyuk, M., Wajda, C., Kawano, Y., Lacey, D., Li, Y., Sikorski, E., Duch, F., Ng, H., Wann, C., Jammy, R., Ieong, M., Shahidi, G.
Published in Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004 (2004)
Published in Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004 (2004)
Get full text
Conference Proceeding
Silicide-induced stress in Si: origin and consequences for MOS technologies
Steegen, An, Maex, Karen
Published in Materials science & engineering. R, Reports : a review journal (04.06.2002)
Published in Materials science & engineering. R, Reports : a review journal (04.06.2002)
Get full text
Journal Article
Competitive and cost effective high-k based 28nm CMOS technology for low power applications
Arnaud, F., Thean, A., Eller, M., Lipinski, M., Teh, Y.W., Ostermayr, M., Kang, K., Kim, N.S., Ohuchi, K., Han, J.-P., Nair, D.R., Lian, J., Uchimura, S., Kohler, S., Miyaki, S., Ferreira, P., Park, J.-H., Hamaguchi, M., Miyashita, K., Augur, R., Zhang, Q., Strahrenberg, K., ElGhouli, S., Bonnouvrier, J., Matsuoka, F., Lindsay, R., Sudijono, J., Johnson, F.S., Ku, J.H., Sekine, M., Steegen, A., Sampson, R.
Published in 2009 IEEE International Electron Devices Meeting (IEDM) (01.12.2009)
Published in 2009 IEEE International Electron Devices Meeting (IEDM) (01.12.2009)
Get full text
Conference Proceeding