Microwave plasma generation by the fast rotation and slow pulsation of resonant fields in a cylindrical cavity
Hasegawa, Yuichi, Nakamura, Keiji, Lubomirsky, Dima, Park, Soonam, Kobayashi, Satoru, Sugai, Hideo
Published in Japanese Journal of Applied Physics (01.04.2017)
Published in Japanese Journal of Applied Physics (01.04.2017)
Get full text
Journal Article
Optimization of hollow cathode discharge electrode for damage free remote plasma removal process for semiconductor manufacturing
Cho, Tae S., Han, Qing, Yang, Dongqing, Park, Soonam, Lubomirsky, Dima, Venkataraman, Shankar
Published in Japanese Journal of Applied Physics (01.05.2016)
Published in Japanese Journal of Applied Physics (01.05.2016)
Get full text
Journal Article
Dual Discharge Modes Operation of an Argon Plasma Generated by Commercial Electronic Ballast for Remote Plasma Removal Process
Cho, Tae S., Yi-Heng Sen, Bokka, Ramesh, Park, Soonam, Lubomirsky, Dima, Venkataraman, Shankar
Published in IEEE transactions on plasma science (01.06.2014)
Published in IEEE transactions on plasma science (01.06.2014)
Get full text
Journal Article
Dual plasma modes operation of hollow cathode electrode system for remote plasma removals for semiconductor manufacturing
Cho, Tae S., Soonam Park, Lubomirsky, Dima, Venkataraman, Shankar
Published in 2016 IEEE International Conference on Plasma Science (ICOPS) (01.06.2016)
Published in 2016 IEEE International Conference on Plasma Science (ICOPS) (01.06.2016)
Get full text
Conference Proceeding
Influence of driving method on discharge mode of damage free remote plasma removal process for semiconductor manufacturing
Cho, Tae S., Qing Han, Soonam Park, Lubomirsky, Dima, Venkataraman, Shankar
Published in 2016 IEEE International Conference on Plasma Science (ICOPS) (01.06.2016)
Published in 2016 IEEE International Conference on Plasma Science (ICOPS) (01.06.2016)
Get full text
Conference Proceeding
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUPPLYING WAVEGUIDE
Lubomirsky, Dmitry, Tran, Toan, Kobayashi, Satoru, Park, Soonam, Sugai, Hideo
Year of Publication 04.07.2024
Get full text
Year of Publication 04.07.2024
Patent
Cylindrical cavity with impedance shifting by irises in a power-supplying waveguide
Lubomirsky, Dmitry, Tran, Toan, Kobayashi, Satoru, Park, Soonam, Sugai, Hideo
Year of Publication 30.04.2024
Get full text
Year of Publication 30.04.2024
Patent
OPERATION METHOD OF ETCHING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
Yang, Janggyoo, Choi, Myungsun, Ha, Jaemin, Park, Soonam, Gwak, Dooyoung
Year of Publication 28.09.2023
Get full text
Year of Publication 28.09.2023
Patent
Multi-zone semiconductor substrate supports
Lubomirsky, Dmitry, Choy, Martin Yue, Yang, Dongqing, Samir, Mehmet Tugrul, Zhu, Lala, Hillman, Peter, Park, Soonam
Year of Publication 27.02.2024
Get full text
Year of Publication 27.02.2024
Patent
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUPPLYING WAVEGUIDE
Lubomirsky, Dmitry, Tran, Toan, Kobayashi, Satoru, Park, Soonam, Sugai, Hideo
Year of Publication 24.03.2022
Get full text
Year of Publication 24.03.2022
Patent
Ceramic showerheads with conductive electrodes
Lubomirsky, Dmitry, Tan, Tien Fak, Loh, LokKee, Singh, Saravjeet, Kim, Tae Won, Park, Soonam, Kalita, Laksheswar
Year of Publication 05.12.2023
Get full text
Year of Publication 05.12.2023
Patent
Systems and methods for improved semiconductor etching and component protection
Lubomirsky, Dmitry, Jung, Soonwook, Tan, Tien Fak, Choy, Martin Yue, Loh, Lok Kee, Park, Soonam
Year of Publication 22.08.2023
Get full text
Year of Publication 22.08.2023
Patent
Low temperature chuck for plasma processing systems
Lubomirsky, Dmitry, Venkataraman, Shankar, Cho, Tae Seung, Phi, Son M, Kobayashi, Satoru, Park, Soonam, Weng, Zilu, Tran, Toan Q
Year of Publication 11.06.2024
Get full text
Year of Publication 11.06.2024
Patent
CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES
Lubomirsky, Dmitry, Tan, Tien Fak, Loh, LokKee, Singh, Saravjeet, Kim, Tae Won, Park, Soonam, Kalita, Laksheswar
Year of Publication 29.06.2023
Get full text
Year of Publication 29.06.2023
Patent
PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING SAME
Yang, Janggyoo, Shim, Seungbo, Kim, Kyungsun, NA, Donghyeon, Park, Soonam
Year of Publication 18.05.2023
Get full text
Year of Publication 18.05.2023
Patent