Systems and methods for improved semiconductor etching and component protection
Lubomirsky, Dmitry, Jung, Soonwook, Tan, Tien Fak, Choy, Martin Yue, Loh, Lok Kee, Park, Soonam
Year of Publication 10.12.2019
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Year of Publication 10.12.2019
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SYSTEMS AND METHODS FOR RADIAL AND AZIMUTHAL CONTROL OF PLASMA UNIFORMITY
Lubomirsky, Dmitry, Tran, Toan, Kalnin, Nikolai, Kobayashi, Satoru, Park, Soonam, Sugai, Hideo
Year of Publication 28.11.2019
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Year of Publication 28.11.2019
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Systems and methods for internal surface conditioning assessment in plasma processing equipment
Ingle, Nitin K, Lubomirsky, Dmitry, Huang, Jiayin, Suarez, Edwin C, Zhu, Yufei, Park, Soonam
Year of Publication 26.11.2019
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Year of Publication 26.11.2019
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Ceramic ring test device
Zhu Yufei, Kobayashi Satoru, Lubomirsky Dmitry, Garg Saurabh, Park Soonam
Year of Publication 19.12.2017
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Year of Publication 19.12.2017
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Rotatable substrate support having radio frequency applicator
Lubomirsky, Dmitry, Hanawa, Hiroji, Kobayashi, Satoru, Floyd, Kirby Hane, Park, Soonam
Year of Publication 29.10.2019
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Year of Publication 29.10.2019
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SEMICONDUCTOR PROCESSING CHAMBER FOR MULTIPLE PRECURSOR FLOW
Lubomirsky, Dmitry, Choy, Martin Yue, Yang, Dongqing, Samir, Mehmet Tugrul, Zhu, Lala, Hillman, Peter, Park, Soonam
Year of Publication 10.10.2019
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Year of Publication 10.10.2019
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RF TAILORED VOLTAGE ON BIAS OPERATION
KIM, Junghoon, LUBOMIRSKY, Dmitry, KOBAYASHI, Satoru, TIAN, Wei, PARK, Soonam, RAUF, Shahid
Year of Publication 10.10.2019
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Year of Publication 10.10.2019
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Systems and methods for radial and azimuthal control of plasma uniformity
Lubomirsky, Dmitry, Tran, Toan, Kalnin, Nikolai, Kobayashi, Satoru, Park, Soonam, Sugai, Hideo
Year of Publication 01.10.2019
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Year of Publication 01.10.2019
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Systems and methods for improved semiconductor etching and component protection
LUBOMIRSKY, DMITRY, PARK, SOONAM, CHOY, MARTIN YUE, JUNG, SOONWOOK, LOH, LOK KEE, TAN, TIEN FAK
Year of Publication 01.07.2024
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Year of Publication 01.07.2024
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MAGNETIC INDUCTION PLASMA SOURCE FOR SEMICONDUCTOR PROCESSES AND EQUIPMENT
KIM, Junghoon, SCHATZ, Kenneth D, CHO, Tae Seung, LUBOMIRSKY, Dmitry, KOBAYASHI, Satoru, PARK, Soonam, JUNG, Soonwook
Year of Publication 06.09.2019
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Year of Publication 06.09.2019
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MAGNETIC INDUCTION PLASMA SOURCE FOR SEMICONDUCTOR PROCESSES AND EQUIPMENT
Schatz, Kenneth D, Lubomirsky, Dmitry, Jung, Soonwook, Kim, Junghoon, Cho, Tae Seung, Kobayashi, Satoru, Park, Soonam
Year of Publication 05.09.2019
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Year of Publication 05.09.2019
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OPTICAL EMISSION SPECTROSCOPY (OES) FOR REMOTE PLASMA MONITORING
Lubomirsky, Dmitry, Kim, Junghoon, Venkataraman, Shankar, Cho, Tae Seung, Park, Soonam
Year of Publication 22.08.2019
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Year of Publication 22.08.2019
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CORROSION RESISTANT GROUND SHIELD OF PROCESSING CHAMBER
HE, Xiao Ming, SUN, Jennifer Y, WU, Xiaowei, KALITA, Laksheswar, LUBOMIRSKY, Dmitry, PARK, Soonam
Year of Publication 11.06.2020
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Year of Publication 11.06.2020
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METHODS AND APPARATUS FOR DYNAMICAL CONTROL OF RADIAL UNIFORMITY IN MICROWAVE CHAMBERS
LUBOMIRSKY, DMITRY, KOBAYASHI, SATORU, PARK, SOONAM, SUGAI, HIDEO, SCUDDER, LANCE, BRITZ, DAVID
Year of Publication 20.06.2019
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Year of Publication 20.06.2019
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Optical emission spectroscopy (OES) for remote plasma monitoring
Lubomirsky, Dmitry, Kim, Junghoon, Venkataraman, Shankar, Cho, Tae Seung, Park, Soonam
Year of Publication 11.06.2019
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Year of Publication 11.06.2019
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