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"SIMPSON, CRAIG R"
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"SIMPSON, CRAIG R"
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PROJECTION SYSTEM WITH METROLOGY
by
DONAHER J. CASEY
,
MCCLEARY ROGER
,
SIMPSON CRAIG R
Year of Publication
31.05.2016
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Patent
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PROJECTION SYSTEM WITH METROLOGY
by
DONAHER J. CASEY
,
MCCLEARY ROGER
,
SIMPSON CRAIG R
Year of Publication
06.02.2014
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PROJECTION SYSTEM WITH METROLOGY
by
MCCLEARY, ROGER
,
SIMPSON
,
CRAIG
,
R
,
DONAHER, J., CASEY
Year of Publication
28.08.2015
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Strategy use and feedback in inspection time
by
Simpson
,
Craig R
.
,
Deary, Ian J.
Published in
Personality and individual differences
(01.11.1997)
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Journal Article
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PROJECTION SYSTEM WITH METROLOGY
by
MCCLEARY, ROGER
,
SIMPSON
,
CRAIG
,
R
,
DONAHER, J., CASEY
Year of Publication
18.06.2014
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PROJECTION SYSTEM WITH METROLOGY
by
MCCLEARY, ROGER
,
SIMPSON
,
CRAIG
,
R
,
DONAHER, J., CASEY
Year of Publication
22.05.2013
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System metrology core
by
DONAHER J. CASEY
,
MCCLEARY ROGER
,
SIMPSON CRAIG R
Year of Publication
12.03.2013
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PROJECTION SYSTEM WITH METROLOGY
by
MCCLEARY, ROGER
,
SIMPSON
,
CRAIG
,
R
,
DONAHER, J., CASEY
Year of Publication
28.02.2013
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PROJECTION SYSTEM WITH METROLOGY
by
MCCLEARY, ROGER
,
SIMPSON
,
CRAIG
,
R
,
DONAHER, J., CASEY
Year of Publication
05.04.2012
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PROJECTION SYSTEM WITH METROLOGY
by
MCCLEARY, ROGER
,
SIMPSON
,
CRAIG
,
R
,
DONAHER, J., CASEY
Year of Publication
19.01.2012
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System Metrology Core
by
DONAHER J. CASEY
,
MCCLEARY ROGER
,
SIMPSON CRAIG R
Year of Publication
19.01.2012
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Platen for use with lithographic stages and method of making same
by
SIMPSON
;
CRAIG R
Year of Publication
27.10.1998
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Platen for use with stages and method of making same
by
CRAIG R
.
SIMPSON
Year of Publication
11.06.1997
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PLATEN FOR USE WITH STAGES AND METHOD OF MAKING SAME
by
SIMPSON
,
CRAIG
,
R
Year of Publication
29.05.1997
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PROJECTION SYSTEM WITH METROLOGY
by
ROGER MCCLEARY
,
CRAIG R
.
SIMPSON
,
CASEY J. DONAHER
Year of Publication
28.07.2014
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Reticle alignment system for use in lithography
by
SIMPSON CRAIG R
,
LUCAS MARK S
Year of Publication
19.11.2002
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Reticle alignment system for use in lithography
by
Simpson
,
Craig R
,
Lucas, Mark S
Year of Publication
19.11.2002
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Reticle alignment system for use in lithography
by
SIMPSON CRAIG R
,
LUCAS MARK S
Year of Publication
04.07.2002
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Reticle alignment system for use in lithography
by
LUCAS MARC S
,
SIMPSON CRAIG R
Year of Publication
20.11.2001
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OPTISCHES AUSRICHTUNGSSYSTEM ZUM GEBRAUCH IN DER PHOTOLITHOGRAPHIE MIT REDUZIERTEM, DURCH DEN REFLEXIONSGRAD BEDINGTEN FEHLER
by
HOLBROOK, DAVID S
,
SIMPSON
,
CRAIG R
Year of Publication
15.02.1995
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