Improvement of adhesion properties of fluorinated silica glass films by nitrous oxide plasma treatment
SWOPE, R, WOO SIK YOO, HSIEH, J, SHUCHMANN, S, NAGY, F, TE NIJENHUIS, H, MORDO, D
Published in Journal of the Electrochemical Society (01.07.1997)
Published in Journal of the Electrochemical Society (01.07.1997)
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