A beam drift reduction device for the X-ray mask E-beam writer, EB-X2
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Conference Proceeding
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Proximity effect correction for X-ray mask fabrication
KURIYAMA, Y, MORIYA, S, UCHIYAMA, S, SHIMAZU, N
Published in Japanese Journal of Applied Physics (1994)
Published in Japanese Journal of Applied Physics (1994)
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Journal Article
Present Status of Exposure Tool Development for Low Energy Electron-beam Proximity Projection Lithography
Endo, Akihiro, Higuchi, Akira, Kasahara, Haruo, Nozue, Hiroshi, Shimazu, Nobuo, Fukui, Toyoji, Yasumitsu, Naoki, Miyatake, Tsutomu, Anazawa, Norimichi
Published in Journal of Photopolymer Science and Technology (01.01.2002)
Published in Journal of Photopolymer Science and Technology (01.01.2002)
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Journal Article
An approach to a high-throughput e-beam writer with a single-gun multiple-path system
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Conference Proceeding
Journal Article
Development of the next-generation electron-beam exposure system
NOZUE, Hiroshi, ENDO, Akihiro, HIGUCHI, Akira, KASA-HARA, Haruo, SHIMAZU, Nobuo
Published in Oyo Buturi (10.04.2002)
Published in Oyo Buturi (10.04.2002)
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Journal Article
ELECTRON BEAM EXPOSURE DEVICE
SHIMAZU, NOBUO, NIHEI, KOICHI, TSUDA, YUKIO, ISE, TOHRU, TSUDA, HIDEAKI, ENDOU, AKIHIRO, YANAGI, YOSHIAKI, FUKUI, TOYOJI, FUJITA, TAICHI
Year of Publication 15.05.2003
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Year of Publication 15.05.2003
Patent
ELECTRON BEAM EXPOSURE DEVICE
SHIMAZU, NOBUO, NIHEI, KOICHI, TSUDA, YUKIO, ISE, TOHRU, TSUDA, HIDEAKI, ENDOU, AKIHIRO, YANAGI, YOSHIAKI, FUKUI, TOYOJI, FUJITA, TAICHI
Year of Publication 15.05.2003
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Year of Publication 15.05.2003
Patent