Influence analysis of removal rate in Si-chemical mechanical planarization/ polishing
UNEDA, Michio, TAKAHASHI, Yoshihiro, SHIBUYA, Kazutaka, NAKAMURA, Yoshio, ICHIKAWA, Daizo, ISHIKAWA, Ken-ichi
Published in Journal of the Japan Society for Abrasive Technology (01.10.2014)
Published in Journal of the Japan Society for Abrasive Technology (01.10.2014)
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Journal Article
Development of system for evaluation of polishing pad surface asperity: Effects of pad surface asperity on removal rate
UNEDA, Michio, MAEDA, Yuki, SHIBUYA, Kazutaka, NAKAMURA, Yoshio, ICHIKAWA, Daizo, ISHIKAWA, Ken-ichi
Published in Journal of the Japan Society for Abrasive Technology (01.06.2013)
Published in Journal of the Japan Society for Abrasive Technology (01.06.2013)
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Journal Article