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Published in Ceramics international (15.08.2019)
Published in Ceramics international (15.08.2019)
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Published in Tribology international (01.05.2020)
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Method for reducing time fog generated on surface of silicon polished wafer
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Gas conveying device and deposition method for silica-based polycrystalline silicon membrane deposition
LIU BIN, LIANG YUDONG, LIU ZUOXING, XU JIPING, SHI XUNDA, ZHAO JING, LI YAODONG, ZHANG SHUO, WANG HAITAO
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Treatment method for prolonging service life of polishing cloth
SHI XUNDA, LIN LIN, ZHOU YINGYING, LI YANJUN, LIU YUNXIA, LI QI, CHEN KEQIANG, YANG SHAOKUN
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Year of Publication 23.06.2020
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Polished silicon wafer processing method capable of obtaining hydrophilic surface
WANG LEI, LIU ZUOXING, XU JIPING, SHI XUNDA, LIN LIN, ZHOU YINGYING, LIU YUNXIA, CHENG FENGLING, LI QI, YANG SHAOKUN
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Year of Publication 09.06.2020
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Device and method for evaluating compactness of silicon-based back sealing film
LIU BIN, ZHANG LIANG, XU JIPING, SHI XUNDA, LIU HAOYI, NING YONGDUO, QU XIANG, LU JINJUN
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Year of Publication 25.06.2019
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Polished silicon wafer cleaning and drying process
WANG LEI, LI JUNFENG, XU JIPING, SHI XUNDA, LIN LIN, LIU YUNXIA, LI YANJUN, CHENG FENGLING, LI QI, YANG SHAOKUN
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Year of Publication 09.06.2020
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Silicon wafer edge polishing process
LI JUNFENG, WANG XIN, SHI XUNDA, LU YICHEN, WANG YUE, PAN ZILONG, LI YAODONG, QU XIANG
Year of Publication 18.06.2019
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Year of Publication 18.06.2019
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