Effect of Co(III) on Defectivity of Electroless Cobalt Capping Layers on Damascene Copper Interconnects
Chen, Qingyun, Valverde, Charles, Figura, Paul, Paneccasio, Vincent, Stritch, Daniel, Hurtubise, Richard, Witt, Christian, Fang, Hongbin, Weidman, Timothy, Shanmugasundram, Arulkumar
Published in ECS transactions (07.02.2007)
Published in ECS transactions (07.02.2007)
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