Suppression of crack formation in wafer-scale amorphous SiNx films by residual hydrogen-ligands manipulation
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Published in Nano Trends (01.09.2024)
Published in Nano Trends (01.09.2024)
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End-to-end testing of IP QoS mechanisms
Shaikh, F.A., McClellan, S., Singh, M., Chakravarthy, S.K.
Published in Computer (Long Beach, Calif.) (01.05.2002)
Published in Computer (Long Beach, Calif.) (01.05.2002)
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