Self-organized pattern formation in radio frequency capacitively coupled discharges
Bera, Kallol, Rauf, Shahid, Forster, John, Collins, Ken
Published in Journal of applied physics (07.02.2021)
Published in Journal of applied physics (07.02.2021)
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Journal Article
The 2012 Plasma Roadmap
Samukawa, Seiji, Hori, Masaru, Rauf, Shahid, Tachibana, Kunihide, Bruggeman, Peter, Kroesen, Gerrit, Whitehead, J Christopher, Murphy, Anthony B, Gutsol, Alexander F, Starikovskaia, Svetlana, Kortshagen, Uwe, Boeuf, Jean-Pierre, Sommerer, Timothy J, Kushner, Mark J, Czarnetzki, Uwe, Mason, Nigel
Published in Journal of physics. D, Applied physics (27.06.2012)
Published in Journal of physics. D, Applied physics (27.06.2012)
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Journal Article
Numerical thermalization in 2D PIC simulations: Practical estimates for low-temperature plasma simulations
Jubin, Sierra, Powis, Andrew Tasman, Villafana, Willca, Sydorenko, Dmytro, Rauf, Shahid, Khrabrov, Alexander V., Sarwar, Salman, Kaganovich, Igor D.
Published in Physics of plasmas (01.02.2024)
Published in Physics of plasmas (01.02.2024)
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Journal Article
Modeling of low pressure plasma sources for microelectronics fabrication
Agarwal, Ankur, Bera, Kallol, Kenney, Jason, Likhanskii, Alexandre, Rauf, Shahid
Published in Journal of physics. D, Applied physics (25.10.2017)
Published in Journal of physics. D, Applied physics (25.10.2017)
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Journal Article
The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions
Tennyson, Jonathan, Mohr, Sebastian, Hanicinec, M, Dzarasova, Anna, Smith, Carrick, Waddington, Sarah, Liu, Bingqing, Alves, Luís L, Bartschat, Klaus, Bogaerts, Annemie, Engelmann, Sebastian U, Gans, Timo, Gibson, Andrew R, Hamaguchi, Satoshi, Hamilton, Kathryn R, Hill, Christian, O’Connell, Deborah, Rauf, Shahid, van ’t Veer, Kevin, Zatsarinny, Oleg
Published in Plasma sources science & technology (01.09.2022)
Published in Plasma sources science & technology (01.09.2022)
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Journal Article
Control of plasma uniformity in a capacitive discharge using two very high frequency power sources
Bera, Kallol, Rauf, Shahid, Ramaswamy, Kartik, Collins, Ken
Published in Journal of applied physics (01.08.2009)
Published in Journal of applied physics (01.08.2009)
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Journal Article
Effect of simultaneous source and bias pulsing in inductively coupled plasma etching
Agarwal, Ankur, Stout, Phillip J., Banna, Samer, Rauf, Shahid, Tokashiki, Ken, Lee, Jeong-Yun, Collins, Ken
Published in Journal of applied physics (15.11.2009)
Published in Journal of applied physics (15.11.2009)
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Journal Article
Power dynamics in a low pressure capacitively coupled plasma discharge
Rauf, Shahid, Bera, Kallol, Collins, Ken
Published in Plasma sources science & technology (01.02.2010)
Published in Plasma sources science & technology (01.02.2010)
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Journal Article
Plasma-Profile Control Using External Circuit in a Capacitively Coupled Plasma Reactor
Bera, K, Rauf, S, Balakrishna, A, Collins, K
Published in IEEE transactions on plasma science (01.11.2010)
Published in IEEE transactions on plasma science (01.11.2010)
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Journal Article
Impact of Phase Shifted Coil Currents on Plasma Uniformity
Agarwal, A., Banna, S., Todorow, V., Rauf, S., Collins, K.
Published in IEEE transactions on plasma science (01.11.2011)
Published in IEEE transactions on plasma science (01.11.2011)
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Journal Article
Synchronous Pulse Plasma Operation upon Source and Bias Radio Frequencys for Inductively Coupled Plasma for Highly Reliable Gate Etching Technology
Tokashiki, Ken, Cho, Hong, Banna, Samer, Lee, Jeong-Yun, Shin, Kyoungsub, Todorow, Valentin, Kim, Woo-Seok, Bai, KeunHee, Joo, Sukho, Choe, Jeong-Dong, Ramaswamy, Kartik, Agarwal, Ankur, Rauf, Shahid, Collins, Ken, Choi, SangJun, Cho, Han, Kim, Hyun Joong, Lee, Changhun, Lymberopoulos, Dimitris, Yoon, Junho, Han, Woosung, Moon, Joo-Tae
Published in Japanese Journal of Applied Physics (01.08.2009)
Published in Japanese Journal of Applied Physics (01.08.2009)
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