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"SEVILLA, ROLAND, K"
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"SEVILLA, ROLAND, K"
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Polishing pad for electrochemical-mechanical polishing
by
SEVILLA
,
ROLAND K
Year of Publication
21.04.2007
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Polishing pad for electrochemical-mechanical polishing
by
SEVILLA ROLAND K
Year of Publication
26.07.2006
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POLISHING PAD FOR ELECTROCHEMICAL-MECHANICAL POLISHING
by
SEVILLA
,
ROLAND K
Year of Publication
29.03.2006
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Multi-layer polishing pad material for CMP
by
PRASAD, ABANESHWAR
,
LACY, MICHAEL, S
,
SEVILLA
,
ROLAND
,
K
Year of Publication
01.05.2013
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POLISHING PAD FOR ELECTROCHEMICAL-MECHANICAL POLISHING
by
SEVILLA
,
ROLAND
,
K
Year of Publication
06.01.2005
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Polishing pad for electrochemical-mechanical polishing
by
SEVILLA ROLAND K
Year of Publication
23.12.2004
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Method for manufacturing a polishing pad having a compressed translucent region
by
JONES JEREMY
,
SEVILLA ROLAND K
Year of Publication
11.01.2005
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Method for manufacturing a polishing pad having a compressed translucent region
by
Jones, Jeremy
,
Sevilla
,
Roland K
Year of Publication
11.01.2005
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METHOD FOR MANUFACTURING A POLISHING PAD HAVING A COMPRESSED TRANSLUCENT REGION
by
JONES, JEREMY
,
SEVILLA
,
ROLAND
,
K
Year of Publication
12.09.2002
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Method for manufacturing a polishing pad having a compressed translucent region
by
JONES JEREMY
,
SEVILLA ROLAND K
Year of Publication
05.09.2002
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MULTI-LAYER POLISHING PAD MATERIAL FOR CMP
by
SEVILLA
,
ROLAND K
,
PRASAD, ABANESHWAR
,
LACY, MICHAEL S
Year of Publication
27.02.2009
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Multi-layer polishing pad material for CMP
by
PRASAD, ABANESHWAR
,
LACY, MICHAEL, S
,
SEVILLA
,
ROLAND
,
K
Year of Publication
18.02.2009
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MULTI-LAYER POLISHING PAD MATERIAL FOR CMP
by
PRASAD, ABANESHWAR
,
LACY, MICHAEL, S
,
SEVILLA
,
ROLAND
,
K
Year of Publication
10.12.2008
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MULTI-LAYER POLISHING PAD MATERIAL FOR CMP
by
ROLAND K
.
SEVILLA
,
MICHAEL S. LACY
,
ABANESHWAR PRASAD
Year of Publication
31.12.2007
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POLISHING PADS FOR A SEMICONDUCTOR SUBSTRATE
by
SRIRAM P. ANJUR
,
ROLAND K
.
SEVILLA
,
FRANK B. KAUFMAN
Year of Publication
30.11.2007
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Method for manufacturing a polishing pad having a compressed translucent region
by
SEVILLA
,
ROLAND K
,
JONES, JEREMY K
Year of Publication
01.09.2003
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Multi-layer polishing pad material for cmp
by
PRASAD ABANESHWAR,
SEVILLA ROLAND K
.,LACY MICHAEL S
Year of Publication
19.07.2006
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MULTI-LAYER POLISHING PAD MATERIAL FOR CMP
by
PRASAD, ABANESHWAR
,
LACY, MICHAEL, S
,
SEVILLA
,
ROLAND
,
K
Year of Publication
03.05.2006
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MULTI-LAYER POLISHING PAD MATERIAL FOR CMP
by
LACY MICHAEL S
,
PRASAD ABANESHWAR
,
SEVILLA ROLAND K
Year of Publication
14.03.2006
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Polishing pad for electrochemical-mechanical polishing
by
SEVILLA
,
ROLAND K
Year of Publication
16.03.2005
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Patent
56 results
56
Subject Area
chemistry
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medicine
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sciences
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Topic
dressing or conditioning of abrading surfaces
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53
feeding of grinding, polishing, or lapping agents
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grinding
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machines, devices, or processes for grinding or polishing
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performing operations
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polishing
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