Demonstration of Solar Cell on a Graphite Sheet with Carbon Diffusion Barrier Evaluation
Cho, Hyelim, Kim, Jaeyeon, Park, Seran, Kim, Soobong, Kim, Hyunjong, Oh, Hoon-Jung, Ko, Dae-Hong
Published in Molecules (Basel, Switzerland) (12.02.2020)
Published in Molecules (Basel, Switzerland) (12.02.2020)
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Journal Article
Two dimensional radial gas flows in atmospheric pressure plasma-enhanced chemical vapor deposition
Kim, Gwihyun, Park, Seran, Shin, Hyunsu, Song, Seungho, Oh, Hoon-Jung, Ko, Dae Hong, Choi, Jung-Il, Baik, Seung Jae
Published in AIP advances (01.12.2017)
Published in AIP advances (01.12.2017)
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Journal Article
Comparison of Strain Characteristics and Contact Resistances of Heavily Phosphorus‐Doped Si Formed by Phosphorus Implantation and In Situ Phosphorus‐Doped Si Epitaxial Growth
Ko, Eunjung, Lee, Juhee, Shin, Hyunsu, Park, Seran, Ko, Daehong
Published in Physica status solidi. A, Applications and materials science (01.06.2020)
Published in Physica status solidi. A, Applications and materials science (01.06.2020)
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Journal Article
Dopant Activation of In Situ Phosphorus‐Doped Silicon Using Multi‐Pulse Nanosecond Laser Annealing
Shin, Hyunsu, Lee, Minhyung, Ko, Eunjung, Ryu, Hwa-yoen, Park, Seran, Kim, Eunha, Ko, Dae-Hong
Published in Physica status solidi. A, Applications and materials science (01.06.2020)
Published in Physica status solidi. A, Applications and materials science (01.06.2020)
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Journal Article
Improvement of contact resistivity of titanium silicide on P-doped epitaxial Si using a Se interlayer
Park, Seran, Choi, Jeong-Min, Shin, Hyunsu, Ko, Eunjung, Ko, Dae-Hong
Published in Applied physics express (01.11.2020)
Published in Applied physics express (01.11.2020)
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Journal Article
Recrystallization and activation of ultra-high-dose phosphorus-implanted silicon using multi-pulse nanosecond laser annealing
Shin, Hyunsu, Lee, Juhee, Lee, Minhyung, Ryu, Hwa-Yeon, Park, Seran, Park, Heungsoo, Ko, Dae-Hong
Published in Japanese Journal of Applied Physics (01.04.2020)
Published in Japanese Journal of Applied Physics (01.04.2020)
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Journal Article
Effect of Ge Concentration on the On-Current Boosting of Logic P-Type MOSFET with Sigma-Shaped Source/Drain
Ko, Eunjung, Lee, Juhee, Ryu, Seung-Wook, Shin, Hyunsu, Park, Seran, Ko, Dae-Hong
Published in Coatings (Basel) (01.06.2021)
Published in Coatings (Basel) (01.06.2021)
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Journal Article
Characterization of strain relaxation behavior in Si1−xGex epitaxial layers by dry oxidation
Jang, Hyunchul, Kim, Byongju, Koo, Sangmo, Park, Seran, Ko, Dae-Hong
Published in Journal of the Korean Physical Society (01.11.2017)
Published in Journal of the Korean Physical Society (01.11.2017)
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Journal Article
Characterization of strain relaxation behavior in Si1−x Ge x epitaxial layers by dry oxidation
Jang, Hyunchul, Kim, Byongju, Koo, Sangmo, Park, Seran, Dae-Hong, Ko
Published in Journal of the Korean Physical Society (01.01.2017)
Published in Journal of the Korean Physical Society (01.01.2017)
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Journal Article
SEMICONDUCTOR DEVICE
Kim, Gyeom, Kim, Jinbum, Lee, Sangmoon, Jo, Chunghee, Park, Seran, Lee, Kiseok, Ko, Daehong, Byeon, Daeseop, Shin, Hyunsu
Year of Publication 09.11.2023
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Year of Publication 09.11.2023
Patent
SiGe surface morphogenesis during dry cleaning with NF3/H2O plasma
Park, Seran, Kim, Kyu-Dong, Oh, Hoon-Jung, Ko, Dae-Hong
Published in 2019 Electron Devices Technology and Manufacturing Conference (EDTM) (01.03.2019)
Published in 2019 Electron Devices Technology and Manufacturing Conference (EDTM) (01.03.2019)
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Conference Proceeding