Investigation of Fixed Oxide Charge and Fin Profile Effects on Bulk FinFET Device Characteristics
Bomsoo Kim, Dong-Il Bae, Zeitzoff, Peter, Xin Sun, Standaert, Theodorus E., Tripathi, Neeraj, Scholze, Andreas, Oldiges, Philip J., Dechao Guo, Huiling Shang, Kang-Ill Seo
Published in IEEE electron device letters (01.12.2013)
Published in IEEE electron device letters (01.12.2013)
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