MICROSCOPIC ANALYSIS OF STRESS-INDUCED LEAKAGE CURRENT IN STRESSED GATE SiO2 FILMS USING CONDUCTIVE ATOMIC FORCE MICROSCOPY
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Published in Jpn.J.Appl.Phys ,Part 2. Vol. 43, no. 2A, pp. L144-L147. 2004 (01.02.2004)
Published in Jpn.J.Appl.Phys ,Part 2. Vol. 43, no. 2A, pp. L144-L147. 2004 (01.02.2004)
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