Search Results - "SEKITO, Takashi" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Extension of 193nm Lithography by Chemical Shrink Process

Extension of 193nm Lithography by Chemical Shrink Process

by Sekito, Takashi, Matsuura, Yuriko, Nagahara, Tatsuro
Published in Journal of Photopolymer Science and Technology (01.01.2016)

Get full text

Journal Article

기판 처리액, 및 이를 사용하는 기판의 제조방법 및 디바이스의 제조방법

기판 처리액, 및 이를 사용하는 기판의 제조방법 및 디바이스의 제조방법

by SEKITO TAKASHI, NAGAHARA TATSURO
Year of Publication 22.11.2023

Get full text

Patent

희생 층의 상부 부분을 제거하는 방법 및 이에 대해사용된 희생 용액 및 산성 수성 용액

희생 층의 상부 부분을 제거하는 방법 및 이에 대해사용된 희생 용액 및 산성 수성 용액

by SEKITO TAKASHI, NAGAHARA TATSURO
Year of Publication 29.08.2023

Get full text

Patent

탄소 재료, 금속 유기 화합물 및 용매를 포함하는 스핀 코팅 조성물, 및 기판 위 금속 산화물 막의 제조 방법

탄소 재료, 금속 유기 화합물 및 용매를 포함하는 스핀 코팅 조성물, 및 기판 위 금속 산화물 막의 제조 방법

by SEKITO TAKASHI, CHO JOONYEON
Year of Publication 12.01.2023

Get full text

Patent

SUBSTRATE-PROCESSING LIQUID, SUBSTRATE PRODUCTION METHOD USING THE SAME, AND DEVICE PRODUCTION METHOD

SUBSTRATE-PROCESSING LIQUID, SUBSTRATE PRODUCTION METHOD USING THE SAME, AND DEVICE PRODUCTION METHOD

by SEKITO TAKASHI, NAGAHARA TATSURO
Year of Publication 03.10.2022

Get full text

Patent

METHOD FOR REMOVING UPPER PART OF SACRIFICIAL LAYER, AND SACRIFICIAL SOLUTION, AND ACIDIC AQUEOUS SOLUTION USED THEREFOR

METHOD FOR REMOVING UPPER PART OF SACRIFICIAL LAYER, AND SACRIFICIAL SOLUTION, AND ACIDIC AQUEOUS SOLUTION USED THEREFOR

by SEKITO TAKASHI, NAGAHARA TATSURO
Year of Publication 05.07.2022

Get full text

Patent

개선된 저장 수명을 갖는, 하드 마스크 및 충전 물질로서 유용한, 무기 산화물 성분 및 알키닐옥시 치환된 스핀-온 탄소 성분을 포함하는 스핀-온 조성물

개선된 저장 수명을 갖는, 하드 마스크 및 충전 물질로서 유용한, 무기 산화물 성분 및 알키닐옥시 치환된 스핀-온 탄소 성분을 포함하는 스핀-온 조성물

by SEKITO TAKASHI, RAHMAN M. DALIL
Year of Publication 22.10.2021

Get full text

Patent

AN ETHYNYL DERIVED COMPOSITE A COMPOSITION COMPRISING THEREOF A METHOD FOR MANUFACTURING A COATING BY IT AND A METHOD FOR MANUFACTURING A DEVICE COMPRISING THE COATING

AN ETHYNYL DERIVED COMPOSITE A COMPOSITION COMPRISING THEREOF A METHOD FOR MANUFACTURING A COATING BY IT AND A METHOD FOR MANUFACTURING A DEVICE COMPRISING THE COATING

by MATSUURA YURIKO, YANAGITA HIROSHI, HAMA YUSUKE, NAKASUGI SHIGEMASA, SEKITO TAKASHI
Year of Publication 19.08.2024

Get full text

Patent

후막-형성 조성물 및 이를 사용한 경화막의 제조 방법

후막-형성 조성물 및 이를 사용한 경화막의 제조 방법

by KUDO TAKANORI, SEKITO TAKASHI, HITOKAWA HIROSHI, NOJIMA YOSHIO
Year of Publication 08.08.2024

Get full text

Patent

METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME

METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME

by YANAGIDA HIROSHI, HIRAYAMA HIROSHI, SEKITO TAKASHI, NAKASUGI SHIGEMASA
Year of Publication 12.03.2024

Get full text

Patent

경화막의 제조방법 및 이의 용도

경화막의 제조방법 및 이의 용도

by YANAGITA HIROSHI, SEKITO TAKASHI, NAKASUGI SHIGEMASA, HIRAYAMA TAKU
Year of Publication 13.01.2022

Get full text

Patent

NOVEL COMPOUND SEMICONDUCTOR MATERIAL AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME

NOVEL COMPOUND SEMICONDUCTOR MATERIAL AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME

by MATSUURA YURIKO, YANAGITA HIROSHI, HAMA YUSUKE, NAKASUGI SHIGEMASA, SEKITO TAKASHI, KUROSAWA KAZUNORI
Year of Publication 27.06.2023

Get full text

Patent

에티닐 유도된 복합체, 이를 포함하는 조성물, 이에 의한 코팅의 제조 방법, 및 코팅을 포함하는 장치의 제조 방법

에티닐 유도된 복합체, 이를 포함하는 조성물, 이에 의한 코팅의 제조 방법, 및 코팅을 포함하는 장치의 제조 방법

by MATSUURA YURIKO, YANAGITA HIROSHI, HAMA YUSUKE, NAKASUGI SHIGEMASA, SEKITO TAKASHI
Year of Publication 26.08.2020

Get full text

Patent

ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING THE SAME, AND METHOD OF MANUFACTURING RESIST UNDERLAYER AND SEMICONDUCTOR DEVICE USING THE SAME

ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING THE SAME, AND METHOD OF MANUFACTURING RESIST UNDERLAYER AND SEMICONDUCTOR DEVICE USING THE SAME

by MATSUURA YURIKO, YANAGIDA HIROSHI, HAMA YUSUKE, NAKASUGI SHIGEMASA, SEKITO TAKASHI
Year of Publication 06.06.2019

Get full text

Patent

FINE RESIST PATTERN-FORMING COMPOSITION AND PATTERN FORMING METHOD USING SAME

FINE RESIST PATTERN-FORMING COMPOSITION AND PATTERN FORMING METHOD USING SAME

by MIYAMOTO YOSHIHIRO, YAMAMOTO KAZUMA, TATSURO NAGAHARA, SEKITO TAKASHI, TAKASHI SEKITO, KAZUMA YAMAMOTO, NAGAHARA TATSURO, YOSHIHIRO MIYAMOTO
Year of Publication 28.08.2015

Get full text

Patent

SEMICONDUCTOR WATER-SOLUBLE COMPOSITION, AND USE THEREOF

SEMICONDUCTOR WATER-SOLUBLE COMPOSITION, AND USE THEREOF

by YAMAMOTO KAZUMA, SEKITO TAKASHI, YASHIMA TOMOYASU, ISHII MAKI, NAGAHARA TATSURO
Year of Publication 16.08.2018

Get full text

Patent

신규한 화합물, 반도체 재료, 및 이를 사용하는 코팅 및 반도체의 제조방법

신규한 화합물, 반도체 재료, 및 이를 사용하는 코팅 및 반도체의 제조방법

by MATSUURA YURIKO, YANAGITA HIROSHI, HAMA YUSUKE, NAKASUGI SHIGEMASA, SEKITO TAKASHI, KUROSAWA KAZUNORI
Year of Publication 28.08.2019

Get full text

Patent

POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION

POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION

by TASHIRO YUJI, SEKITO TAKASHI, FUKUIE TAKASHI, NONAKA TOSHIAKI, YOKOYAMA HIROSHI
Year of Publication 17.11.2016

Get full text

Patent

VINYL DERIVATIVE AND USE THEREOF

VINYL DERIVATIVE AND USE THEREOF

by MATSUURA YURIKO, YANAGIDA HIROSHI, HAMA YUSUKE, SEKITO TAKASHI, NAKASUGI SHIGEMASA, HIRAYAMA TAKU, KUROSAWA KAZUNORI
Year of Publication 13.09.2018

Get full text

Patent

COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING METHOD USING SAME

COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING METHOD USING SAME

by OKAYASU TETSUO, SEKITO TAKASHI, ISHII MASAHIRO
Year of Publication 16.07.2014

Get full text

Patent

1
2
3
4
5
6
7
8
9
Next
[9]