Search Results - "SEINO, YURIKO" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Characterization of half-pitch 15-nm metal wire circuit fabricated by directed self-assembly of polystyrene-block-poly(methyl methacrylate)

Characterization of half-pitch 15-nm metal wire circuit fabricated by directed self-assembly of polystyrene-block-poly(methyl methacrylate)

by Kasahara, Yusuke, Seino, Yuriko, Sato, Hironobu, Kanai, Hideki, Kobayashi, Katsutoshi, Kubota, Hitoshi, Miyagi, Ken, Minegishi, Shinya, Kodera, Katsuyoshi, Kihara, Naoko, Nomura, Satoshi, Tobana, Toshikatsu, Shiraishi, Masayuki, Kawamonzen, Yoshiaki, Azuma, Tsukasa
Published in Microelectronic engineering (15.06.2016)

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Precise Synthesis of Fluorine-containing Block Copolymers via RAFT

Precise Synthesis of Fluorine-containing Block Copolymers via RAFT

by Nakatani, Ryuichi, Takano, Hiroki, Wang, Lei, Chandra, Alvin, Tanaka, Yuki, Maeda, Rina, Kihara, Naoko, Minegishi, Shinya, Miyagi, Ken, Kasahara, Yusuke, Sato, Hironobu, Seino, Yuriko, Azuma, Tsukasa, Ober, Christopher K., Hayakawa, Teruaki
Published in Journal of Photopolymer Science and Technology (01.01.2016)

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Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers

Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers

by Takano, Hiroki, Wang, Lei, Tanaka, Yuki, Maeda, Rina, Kihara, Naoko, Seino, Yuriko, Sato, Hironobu, Kawamonzen, Yoshiaki, Miyagi, Ken, Minegishi, Shinya, Azuma, Tsukasa, Ober, Christopher K., Hayakawa, Teruaki
Published in Journal of Photopolymer Science and Technology (01.01.2015)

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Fabrication of Sub-10 nm Metal Wire Circuits using Directed Self-Assembly of Block Copolymers

Fabrication of Sub-10 nm Metal Wire Circuits using Directed Self-Assembly of Block Copolymers

by Azuma, Tsukasa, Seino, Yuriko, Sato, Hironobu, Kasahara, Yusuke, Kobayashi, Katsutoshi, Kubota, Hitoshi, Kanai, Hideki, Kodera, Katsuyoshi, Kihara, Naoko, Kawamonzen, Yoshiaki, Minegishi, Shinya, Miyagi, Ken, Yamano, Hitoshi, Tobana, Toshikatsu, Shiraishi, Masayuki, Nomura, Satoshi
Published in Journal of Photopolymer Science and Technology (01.01.2016)

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A novel simple sub-15nm line-and-space patterning process flow using directed self-assembly technology

A novel simple sub-15nm line-and-space patterning process flow using directed self-assembly technology

by Seino, Yuriko, Kasahara, Yusuke, Sato, Hironobu, Kobayashi, Katsutoshi, Miyagi, Ken, Minegishi, Shinya, Kodera, Katsuyoshi, Kanai, Hideki, Tobana, Toshikatsu, Kihara, Naoko, Fujiwara, Tomoharu, Hirayanagi, Noriyuki, Kawamonzen, Yoshiaki, Azuma, Tsukasa
Published in Microelectronic engineering (01.02.2015)

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A Simulation Study on Defectivity in Directed Self-assembly Lithography

A Simulation Study on Defectivity in Directed Self-assembly Lithography

by Kodera, Katsuyoshi, Kanai, Hideki, Sato, Hironobu, Seino, Yuriko, Kobayashi, Katsutoshi, Kasahara, Yusuke, Kubota, Hitoshi, Kihara, Naoko, Kawamonzen, Yoshiaki, Minegishi, Shinya, Miyagi, Ken, Shiraishi, Masayuki, Tobana, Toshikatsu, Nomura, Satoshi, Azuma, Tsukasa
Published in Journal of Photopolymer Science and Technology (01.01.2015)

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Electrical Via Chain Yield for DSA Contact Hole Shrink Process

Electrical Via Chain Yield for DSA Contact Hole Shrink Process

by Kato, Hirokazu, Seino, Yuriko, Yonemitsu, Hiroki, Sato, Hironobu, Kanno, Masahiro, Kobayashi, Katsutoshi, Kawanishi, Ayako, Imamura, Tsubasa, Omura, Mitsuhiro, Nakamura, Naofumi, Azuma, Tsukasa
Published in Journal of Photopolymer Science and Technology (01.01.2013)

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The Photopolymer Science and Technology Award

The Photopolymer Science and Technology Award

by Takano, Hiroki, Wang, Lei, Tanaka, Yuki, Maeda, Rina, Kihara, Naoko, Seino, Yuriko, Sato, Hironobu, Kawamonzen, Yoshiaki, Miyagi, Ken, Minegishi, Shinya, Azuma, Tsukasa, Ober, Christopher K., Hayakawa, Teruaki
Published in Journal of Photopolymer Science and Technology (01.01.2016)

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Sub-30nm via interconnects fabricated using directed self-assembly

Sub-30nm via interconnects fabricated using directed self-assembly

by Kato, Hirokazu, Seino, Yuriko, Yonemitsu, Hiroki, Sato, Hironobu, Kanno, Masahiro, Kobayashi, Katsutoshi, Kawanishi, Ayako, Imamura, Tsubasa, Omura, Mitsuhiro, Nakamura, Naofumi, Azuma, Tsukasa
Published in Microelectronic engineering (01.10.2013)

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Application of Directed Self-Assembly Lithography to Semiconductor Device Manufacturing Process

Application of Directed Self-Assembly Lithography to Semiconductor Device Manufacturing Process

by SEINO, YURIKO, KATO, HIROKAZU, YONEMITSU, HIROKI, SATO, HIRONOBU, KANNO, MASAHIRO, KOBAYASHI, KATSUTOSHI, KAWANISHI, AYAKO, AZUMA, TSUKASA
Published in Electronics and communications in Japan (01.04.2015)

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A Challenge to the Micro-phase Separation Limit of PS-b-PMMA by Doping with Hydrophilic Materials

A Challenge to the Micro-phase Separation Limit of PS-b-PMMA by Doping with Hydrophilic Materials

by Kawamonzen, Yoshiaki, Kihara, Naoko, Seino, Yuriko, Sato, Hironobu, Kasahara, Yusuke, Kobayashi, Katsutoshi, Kodera, Katsuyoshi, Kanai, Hideki, Kubota, Hitoshi, Miyagi, Ken, Minegishi, Shinya, Tobana, Toshikatsu, Shiraishi, Masayuki, Azuma, Tsukasa
Published in Journal of Photopolymer Science and Technology (01.01.2015)

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Resist Residue in Ion Implantation Level Lithography

Resist Residue in Ion Implantation Level Lithography

by Ojima, Tomoko, Asano, Masafumi, Takahashi, Masanori, Seino, Yuriko, Mimotogi, Shoji
Published in Japanese Journal of Applied Physics (01.06.2010)

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Blockcopolymer Self-Assembly Directed by Photochemically Attached Polymer Surface Layer

Blockcopolymer Self-Assembly Directed by Photochemically Attached Polymer Surface Layer

by Hattori, Shigeki, Asakawa, Koji, Mikoshiba, Satoshi, Nakamura, Hiroko, Hieno, Atsushi, Seino, Yuriko, Kanno, Mashiro, Azuma, Tsukasa
Published in Journal of Photopolymer Science and Technology (01.01.2011)

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The Photopolymer Science and Technology Award

The Photopolymer Science and Technology Award

by Kato, Hirokazu, Seino, Yuriko, Yonemitsu, Hiroki, Sato, Hironobu, Kanno, Masahiro, Kobayashi, Katsutoshi, Kawanishi, Ayako, Imamura, Tsubasa, Omura, Mitsuhiro, Nakamura, Naofumi, Azuma, Tsukasa
Published in Journal of Photopolymer Science and Technology (01.01.2014)

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Quick Formation of DSA Neutralization Polymer Layer Attached by Reactive Self-Assembled Monolayer

Quick Formation of DSA Neutralization Polymer Layer Attached by Reactive Self-Assembled Monolayer

by Hieno, Atsushi, Hattori, Shigeki, Nakamura, Hiroko, Asakawa, Koji, Seino, Yuriko, Kanno, Masahiro, Azuma, Tsukasa
Published in Journal of Photopolymer Science and Technology (01.01.2012)

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Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High‑χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing

Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High‑χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing

by Nakatani, Ryuichi, Takano, Hiroki, Chandra, Alvin, Yoshimura, Yasunari, Wang, Lei, Suzuki, Yoshinori, Tanaka, Yuki, Maeda, Rina, Kihara, Naoko, Minegishi, Shinya, Miyagi, Ken, Kasahara, Yuusuke, Sato, Hironobu, Seino, Yuriko, Azuma, Tsukasa, Yokoyama, Hideaki, Ober, Christopher K, Hayakawa, Teruaki
Published in ACS applied materials & interfaces (20.09.2017)

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Methemoglobin Formation in Hemoglobin Vesicles and Reduction by Encapsulated Thiols

Methemoglobin Formation in Hemoglobin Vesicles and Reduction by Encapsulated Thiols

by Takeoka, Shinji, Sakai, Hiromi, Kose, Takehiro, Mano, Yuichi, Seino, Yuriko, Nishide, Hiroyuki, Tsuchida, Eishun
Published in Bioconjugate chemistry (01.07.1997)

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Direct In Situ Observation of the Early‐Stage Disorder–Order Evolution of Perpendicular Lamellae in Thermally Annealed High‐χ Block Copolymer Thin Films

Direct In Situ Observation of the Early‐Stage Disorder–Order Evolution of Perpendicular Lamellae in Thermally Annealed High‐χ Block Copolymer Thin Films

by Chandra, Alvin, Nakatani, Ryuichi, Uchiyama, Takumi, Seino, Yuriko, Sato, Hironobu, Kasahara, Yusuke, Azuma, Tsukasa, Hayakawa, Teruaki
Published in Advanced materials interfaces (01.06.2019)

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Self‐Assembly: Direct In Situ Observation of the Early‐Stage Disorder–Order Evolution of Perpendicular Lamellae in Thermally Annealed High‐χ Block Copolymer Thin Films (Adv. Mater. Interfaces 11/2019)

Self‐Assembly: Direct In Situ Observation of the Early‐Stage Disorder–Order Evolution of Perpendicular Lamellae in Thermally Annealed High‐χ Block Copolymer Thin Films (Adv. Mater. Interfaces 11/2019)

by Chandra, Alvin, Nakatani, Ryuichi, Uchiyama, Takumi, Seino, Yuriko, Sato, Hironobu, Kasahara, Yusuke, Azuma, Tsukasa, Hayakawa, Teruaki
Published in Advanced materials interfaces (07.06.2019)

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Suppression of Methemoglobin Formation by Glutathione in a Concentrated Hemoglobin Solution and in a Hemoglobin-Vesicle

Suppression of Methemoglobin Formation by Glutathione in a Concentrated Hemoglobin Solution and in a Hemoglobin-Vesicle

by Sakai, Hiromi, Takeoka, Shinji, Seino, Yuriko, Tsuchida, Eishun
Published in Bulletin of the Chemical Society of Japan (01.04.1994)

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