ALD of Hafnium Oxide Thin Films from Tetrakis(ethylmethylamino)hafnium and Ozone
Liu, Xinye, Ramanathan, Sasangan, Longdergan, Ana, Srivastava, Anuranjan, Lee, Eddie, Seidel, Thomas E., Barton, Jeffrey T., Pang, Dawen, Gordon, Roy G.
Published in Journal of the Electrochemical Society (2005)
Published in Journal of the Electrochemical Society (2005)
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Journal Article
Thin film atomic layer deposition equipment for semiconductor processing
Sneh, Ofer, Clark-Phelps, Robert B, Londergan, Ana R, Winkler, Jereld, Seidel, Thomas E
Published in Thin solid films (2002)
Published in Thin solid films (2002)
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Journal Article
Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”
Ahvenniemi, Esko, Akbashev, Andrew R., Ali, Saima, Bechelany, Mikhael, Berdova, Maria, Boyadjiev, Stefan, Cameron, David C., Chen, Rong, Chubarov, Mikhail, Cremers, Veronique, Devi, Anjana, Drozd, Viktor, Elnikova, Liliya, Gottardi, Gloria, Grigoras, Kestutis, Hausmann, Dennis M., Hwang, Cheol Seong, Jen, Shih-Hui, Kallio, Tanja, Kanervo, Jaana, Khmelnitskiy, Ivan, Kim, Do Han, Klibanov, Lev, Koshtyal, Yury, Krause, A. Outi I., Kuhs, Jakob, Kärkkänen, Irina, Kääriäinen, Marja-Leena, Kääriäinen, Tommi, Lamagna, Luca, Łapicki, Adam A., Leskelä, Markku, Lipsanen, Harri, Lyytinen, Jussi, Malkov, Anatoly, Malygin, Anatoly, Mennad, Abdelkader, Militzer, Christian, Molarius, Jyrki, Norek, Małgorzata, Özgit-Akgün, Çağla, Panov, Mikhail, Pedersen, Henrik, Piallat, Fabien, Popov, Georgi, Puurunen, Riikka L., Rampelberg, Geert, Ras, Robin H. A., Rauwel, Erwan, Roozeboom, Fred, Sajavaara, Timo, Salami, Hossein, Savin, Hele, Schneider, Nathanaelle, Seidel, Thomas E., Sundqvist, Jonas, Suyatin, Dmitry B., Törndahl, Tobias, van Ommen, J. Ruud, Wiemer, Claudia, Ylivaara, Oili M. E., Yurkevich, Oksana
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01.01.2017)
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01.01.2017)
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Book Review
Erratum: ALD of Hafnium Oxide Thin Films from Tetrakis(ethylmethylamino)hafnium and Ozone [J. Electrochem. Soc., 152, G213 (2005)]
Liu, Xinye, Ramanathan, Sasangan, Longdergan, Ana, Srivastava, Anuranjan, Lee, Eddie, Seidel, Thomas E., Barton, Jeffrey T., Pang, Dawen, Gordon, Roy G.
Published in Journal of the Electrochemical Society (2005)
Published in Journal of the Electrochemical Society (2005)
Get full text
Journal Article