Rigorous Model-Based Mask Data Preparation Algorithm Applied to Grayscale Lithography for the Patterning at the Micrometer Scale
Chevalier, Pierre, Quemere, Patrick, Berard-Bergery, Sebastien, Henry, Jean-Baptist, Beylier, Charlotte, Vaillant, Jerome
Published in Journal of microelectromechanical systems (01.06.2021)
Published in Journal of microelectromechanical systems (01.06.2021)
Get full text
Journal Article