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"SCHUTZ, RONALD J"
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"SCHUTZ, RONALD J"
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IMPROVED ALUMINUM(AL) METALLIZATION FOR SEMICONDUCTOR DEVICE
by
RYAN, VIVIAN W
,
SCHUTZ
,
RONALD J
Year of Publication
28.02.1994
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DEVICE MANUFACTURING PROCESS INCLUDING DRY ETCHING
by
SCHUTZ RONALD J
Year of Publication
04.08.2000
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METHOD FOR INCREASING METAL-REMOVAL RATE DURING CHEMICAL-MECHANICAL POLISHING PROCESS FOR SEMICONDUCTOR, AND CMP METHOD
by
SCHUTZ RONALD J
Year of Publication
30.06.2000
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Polyelectrolyte dispensing polishing pad
by
SIMPSON ALEXANDER W
,
SCHUTZ RONALD J
Year of Publication
14.07.2005
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GE ordered to pay MRI Pioneer $110 million for patent infringement
by
Schutz
,
Ronald J
Published in
PR Newswire
(27.05.1995)
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Newsletter
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Structure for stopping mechanical cracks in a substrate wafer, use of the structure and a method for producing the structure
by
SEIDL HARALD
,
GUTSCHE MARTIN U
,
SCHUTZ RONALD J
Year of Publication
27.09.2007
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MANUFACTURE PROCESS FOR INTEGRATED CIRCUIT HAVING SHALLOW JUNCTION
by
LIFSHITZ NADIA
,
SCHUTZ RONALD J
Year of Publication
28.01.2000
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DRY ETHCING PROCEDURE AND DEVICES FORMED BY THIS PROCEDURE
by
SCHUTZ
,
RONALD J
Year of Publication
16.07.1993
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COMPOSITIONS FOR AND METHODS OF REDUCING/ELIMINATING SCRATCHES AND DEFECTS IN SILICON DIOXIDE CMP PROCESS
by
NOJO, HARUKI
,
SCHUTZ
,
RONALD
,
J
,
RAMACHANDRAN, RAVIKUMAR
Year of Publication
02.07.2003
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PROCEDURE FOR FABRICATING DEVICES INVOLVING DRY ETCHING
by
SCHUTZ
,
RONALD J
Year of Publication
13.08.1991
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Quickview Systems Sues Apple Computer for Patent Infringement on Hypercard
by
Schutz
,
Ronald J
Published in
Business Wire
(24.10.1989)
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COMPOSITIONS FOR AND METHODS OF REDUCING/ELIMINATING SCRATCHES AND DEFECTS IN SILICON DIOXIDE CMP PROCESS
by
NOJO, HARUKI
,
SCHUTZ
,
RONALD
,
J
,
RAMACHANDRAN, RAVIKUMAR
Year of Publication
03.07.2002
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Dry etching procedure
by
SCHUTZ
;
RONALD J
Year of Publication
15.11.1988
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Compositions for and method of reducing/eliminating scratches and defects in silicon dioxide during CMP process
by
RAMACHANDRAN RAVIKUMAR
,
NOJO HARUKI
,
SCHUTZ RONALD J
Year of Publication
16.10.2001
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COMPOSITIONS FOR AND METHODS OF REDUCING/ELIMINATING SCRATCHES AND DEFECTS IN SILICON DIOXIDE CMP PROCESS
by
NOJO, HARUKI
,
SCHUTZ
,
RONALD
,
J
,
RAMACHANDRAN, RAVIKUMAR
Year of Publication
05.04.2001
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SEMICONDUCTOR FABRICATING METHOD AND THE DEVICE
by
LIFSHITZ, NADIA
,
SCHUTZ
,
RONALD J
Year of Publication
30.03.1993
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PROCESS FOR FABRICATING INTEGRATED CIRCUITS HAVING SHALLOW JUNCTIONS
by
LIFSHITZ, NADIA
,
SCHUTZ
,
RONALD J
Year of Publication
16.03.1993
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FABRICATION METHOD IN VERTICAL INTEGRATION
by
SCHUTZ
;
RONALD J
,
LIFSHITZ; NADIA
Year of Publication
24.11.1992
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Process for fabricating integrated circuits having shallow junctions
by
SCHUTZ
;
RONALD J
,
LIFSHITZ; NADIA
Year of Publication
22.09.1992
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Strategies for patent holders contemplating litigation
by
Schutz
,
Ronald J
,
Hall, Ken R
Published in
Managing Intellectual Property
(01.01.1999)
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Trade Publication Article
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