Method of wavefront measurement calibration of projection optical system used in lithographic scanner equipment, forms interference pattern from object pattern and image measurement patterns
HAIDNER, HELMUT, WEGMANN, ULRICH, SCHRIEVER, MARTIN, HARTL, MICHAEL, GOEPPERT, MARKUS, LAUER, STEFFEN
Year of Publication 01.06.2006
Get full text
Year of Publication 01.06.2006
Patent
Messvorrichtung zum Vermessen einer Abbildungsgüte eines EUV-Objektives
FRESE, RALF, HAIDNER, HELMUT, SCHRIEVER, MARTIN, HOCH, RAINER, DEGUENTHER, MARKUS, SAMANIEGO, MICHAEL
Year of Publication 26.09.2013
Get full text
Year of Publication 26.09.2013
Patent
Device and method for the optical measurement of an optical system, a container therefor, and a microlithography projection exposure machine
SCHELLHORN UWE, HAIDNER HELMUT, WEGMANN ULRICH, SCHRIEVER MARTIN, GOBPPERT MARKUS, EHRMANN ALBRECHT, STUEHLER JOACHIM
Year of Publication 03.11.2005
Get full text
Year of Publication 03.11.2005
Patent
Process for the decontamination of microlithographic projection exposure devices
ZEHETBAUER MARCUS, SCHRIEVER MARTIN, REISINGER GERD, SIELER CHRISTINE, GERHARD MICHAEL, DIECKMANN NILS
Year of Publication 30.08.2005
Get full text
Year of Publication 30.08.2005
Patent
Process for the decontamination of microlithographic projection exposure devices
Gerhard, Michael, Dieckmann, Nils, Sieler, Christine, Zehetbauer, Marcus, Schriever, Martin, Reisinger, Gerd
Year of Publication 30.08.2005
Get full text
Year of Publication 30.08.2005
Patent
Microlithography installation investigation device for determination of the effect of a microlithography UV light projecting installation on the polarization direction of UV radiation incident on it
DAHL, MANFRED, MENGEL, MARKUS, HAIDNER, HELMUT, WEGMANN, ULRICH, TOTZECK, MICHAEL, SCHRIEVER, MARTIN, HARTL, MICHAEL
Year of Publication 12.02.2004
Get full text
Year of Publication 12.02.2004
Patent
OPTICAL APPARATUS WITH CORRECTED OR IMPROVED IMAGING BEHAVIOUR
HUBER, JUERGEN, HEMBACHER, STEFAN, WEGMANN, ULRICH, TOTZECK, MICHAEL, SCHRIEVER, MARTIN, KERWIEN, NORBERT, HAUF, MARKUS, GEUPPERT, BERNHARD
Year of Publication 20.04.2011
Get full text
Year of Publication 20.04.2011
Patent
Process for the decontamination of microlithographic projection exposure devices
Dieckmann, Nils, Gerhard, Michael, Sieler, Christine, Zehetbauer, Marcus, Schriever, Martin, Reisinger, Gerd
Year of Publication 04.10.2001
Get full text
Year of Publication 04.10.2001
Patent
Process for the decontamination of microlithographic projection exposure devices
ZEHETBAUER MARCUS, SCHRIEVER MARTIN, REISINGER GERD, SIELER CHRISTINE, GERHARD MICHAEL, DIECKMANN NILS
Year of Publication 04.10.2001
Get full text
Year of Publication 04.10.2001
Patent