The ring phenomenon of diluted blood droplets
Ramsthaler, Frank, Schlote, J., Wagner, C., Fiscina, J., Kettner, M.
Published in International journal of legal medicine (01.05.2016)
Published in International journal of legal medicine (01.05.2016)
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Journal Article
Child abuse from a pediatric perspective
Meyer, S, Poryo, M, Clasen, O, Schlote, J, Schmidt, P, Schöndorf, D, Lehmann-Kannt, S, Gortner, L
Published in Radiologe (01.05.2016)
Published in Radiologe (01.05.2016)
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Journal Article
Phosphorus segregation at polysilicon-silicon interfaces from in situ P spike-doped silicon films
Kruger, D, Gaworzewski, P, Kurps, R, Schlote, J
Published in Semiconductor science and technology (01.03.1995)
Published in Semiconductor science and technology (01.03.1995)
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Journal Article
Kindesmisshandlung aus pädiatrischer Sicht
Meyer, S., Poryo, M., Clasen, O., Schlote, J., Schmidt, P., Schöndorf, D., Lehmann-Kannt, S., Gortner, L.
Published in Radiologe (2016)
Published in Radiologe (2016)
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Journal Article
Topological effects regarding trench structures covered with LPCVD and PECVD thin films
Schlote, J., Hinrich, S., Kuck, B., Schröder, K.-W.
Published in Surface & coatings technology (01.10.1993)
Published in Surface & coatings technology (01.10.1993)
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Journal Article
Conference Proceeding
Shallow junction formation by phosphorus diffusion from in situ spike-doped chemical vapor deposited amorphous silicon
Krüger, D., Schlote, J., Röpke, W., Kurps, R., Quick, Ch
Published in Microelectronic engineering (01.04.1995)
Published in Microelectronic engineering (01.04.1995)
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Journal Article
Simulation of step coverage in chemical vapor deposition processes
SCHRODER, K.-W, SCHLOTE, J, HINRICH, S
Published in Journal of the Electrochemical Society (01.08.1991)
Published in Journal of the Electrochemical Society (01.08.1991)
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Journal Article
Topological effects regarding edge structures in CVD processes
SCHOLTE, J, SCHRÖDER, K.-W, MORGENSTERN, G
Published in Journal of the Electrochemical Society (01.06.1990)
Published in Journal of the Electrochemical Society (01.06.1990)
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Journal Article
Comparison of P In Situ Spike Doped with as Implanted Poly Silicon Emitters Concerning Si/SiGe/Si HBT Application
Knoll, D., Heinemann, B., Ehwald, K.E., Schley, P., Ropke, W., Bolze, D., Schlote, J., Herzel, F., Fischer, G.
Published in ESSDERC '95: Proceedings of the 25th European Solid State Device Research Conference (01.09.1995)
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Published in ESSDERC '95: Proceedings of the 25th European Solid State Device Research Conference (01.09.1995)
Conference Proceeding
Reducing Transient Enhanced Diffusion of Boron in Si/SiGe Heterojunction Bipolar Transistors by BBR3 Predeposition for External Base Doping
Schmundt, H., Knoll, D., Heinemann, B., Schley, P., Winter, H., Kuck, B., Schlote, J., Blum, K., Kurps, R., Grabolla, T., Rucker, H., Tillack, B., Bolze, K.D.
Published in 28th European Solid-State Device Research Conference (1998)
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Published in 28th European Solid-State Device Research Conference (1998)
Conference Proceeding