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"SCHEDEL THORSTEN"
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"SCHEDEL THORSTEN"
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VERFAHREN ZU DURCHFÜHRUNG EINER AUSRICHTUNGSMESSUNG VON ZWEI MUSTERN IN UNTERSCHIEDLICHEN SCHICHTEN EINES HALBLEITERWAFERS
by
HEINE, ROLF
,
SCHMIDT, SEBASTIAN
,
SCHEDEL
,
THORSTEN
Year of Publication
15.01.2005
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Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer
by
HEINE, ROLF
,
SCHMIDT, SEBASTIAN
,
SCHEDEL
,
THORSTEN
Year of Publication
29.12.2004
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Werkwijze voor het dynamisch aanpassen van de dosis in een lithografisch projectieapparaat en projectieapparaat
by
KARL SCHUMACHER
,
THORSTEN SCHEDEL
Year of Publication
11.12.2007
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Method for controlling the quality of a lithographic structuring step
by
Schedel
,
Thorsten
,
Zimmermann, Jens
,
Schmidt, Sebastian
Year of Publication
24.08.2004
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Method for controlling the quality of a lithographic structuring step
by
SCHEDEL THORSTEN
,
ZIMMERMANN JENS
,
SCHMIDT SEBASTIAN
Year of Publication
24.08.2004
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Method for adjusting processing parameters of at least one plate-shaped object in a processing tool
by
MAUTZ KARL
,
SCHEDEL THORSTEN
,
SCHMIDT SEBASTIAN
Year of Publication
01.07.2004
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Method for adjusting processing parameters of at least one plate-shaped object in a processing tool
by
Mautz, Karl
,
Schmidt, Sebastian
,
Schedel
,
Thorsten
Year of Publication
01.07.2004
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Cleaning system for projection lens for formation of semiconductor and integrated circuit structures on baseplate has supply of gas fed to lens and has gas analysis equipment
by
SCHMIDT, SEBASTIAN
,
HRASCHAN, GUENTHER
,
SCHEDEL
,
THORSTEN
Year of Publication
27.05.2004
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Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer
by
Heine, Rolf
,
Schmidt, Sebastian
,
Schedel
,
Thorsten
Year of Publication
27.05.2004
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Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer
by
HEINE ROLF
,
SCHEDEL THORSTEN
,
SCHMIDT SEBASTIAN
Year of Publication
27.05.2004
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Method for aligning and exposing a semiconductor wafer
by
Schedel
,
Thorsten
,
Rossiger, Martin
,
Stacker, Jens
Year of Publication
29.04.2004
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Method for aligning and exposing a semiconductor wafer
by
STACKER JENS
,
SCHEDEL THORSTEN
,
ROSSIGER MARTIN
Year of Publication
29.04.2004
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Process for projecting at least two masks onto a substrate in integrated circuit production uses lens and mask combination on test structure to minimize deviations
by
SCHMIDT, SEBASTIAN
,
SCHEDEL
,
THORSTEN
,
KUNKEL, GERHARD
Year of Publication
29.01.2004
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Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer
by
HEINE, ROLF
,
SCHMIDT, SEBASTIAN
,
SCHEDEL
,
THORSTEN
Year of Publication
01.12.2003
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Method for adjusting processing parameters of at least one plate-like object in a processing tool
by
SCHMIDT, SEBASTIAN
,
SCHEDEL
,
THORSTEN
,
MAUTZ, KARL
Year of Publication
01.10.2003
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Method for controlling the quality of a lithographic structuring step
by
SCHMIDT, SEBASTIAN
,
SCHEDEL
,
THORSTEN
,
ZIMMERMANN, JENS
Year of Publication
01.09.2003
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Method of forming a line structure in a layer of a semiconductor wafer
by
SCHMIDT, SEBASTIAN
,
SCHEDEL
,
THORSTEN
,
SPULER, BRUNO
Year of Publication
16.07.2003
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METHOD AND ARRANGEMENT FOR THE MANIPULATION OF RETICLES
by
SCHEDEL
,
THORSTEN
,
SCHUMACHER, KARL
Year of Publication
30.08.2006
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Measuring structure for determining positioning accuracy of semiconductor wafer or exposure mask has reference structure and associated protection structures
by
HEINE, ROLF
,
SCHEDEL
,
THORSTEN
,
SPULER, BRUNO
Year of Publication
30.04.2003
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Method for controlling the quality of a lithographic structuring step
by
SCHEDEL THORSTEN
,
ZIMMERMANN JENS
,
SCHMIDT SEBASTIAN
Year of Publication
27.02.2003
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