Enhancement of the ion flux to the substrate through high-voltage biasing in an electron cyclotron resonance plasma and its application to high-speed deposition of conductive carbon film
Bae, Hansin, Hamaguchi, Ikumi, Sasai, Kensuke, Suzuki, Haruka, Toyoda, Hirotaka
Published in Japanese Journal of Applied Physics (01.12.2021)
Published in Japanese Journal of Applied Physics (01.12.2021)
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Journal Article
Low-pressure sustainment of surface-wave microwave plasma with modified microwave coupler
Sasai, Kensuke, Suzuki, Haruka, Toyoda, Hirotaka
Published in Japanese Journal of Applied Physics (01.01.2016)
Published in Japanese Journal of Applied Physics (01.01.2016)
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Journal Article
Observation of penultimate effect by ESR of the model-propagating acrylate radical
Tanaka, Hitoshi, Sasai, Kensuke, Sato, Tsuneyuki, Ota, Tadatoshi
Published in Macromolecules (01.12.1988)
Published in Macromolecules (01.12.1988)
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Journal Article