Novel Chemical Mechanical Polishing/Plasma-Chemical Vaporization Machining (CMP/P-CVM) Combined Processing of Hard-to-Process Crystals Based on Innovative Concepts
Doi, Toshiro K, Sano, Yasuhisa, Kurowaka, Syuhei, Aida, Hideo, Ohnishi, Osamu, Uneda, Michio, Ohyama, Koki
Published in Sensors and materials (2014)
Published in Sensors and materials (2014)
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Mechanism of atomic-scale passivation and flattening of semiconductor surfaces by wet-chemical preparations : ATOMICALLY CONTROLLED FABRICATION
ARIMA, Kenta, ENDO, Katsuyoshi, YAMAUCHI, Kazuto, HIROSE, Kikuji, ONO, Tomoya, SANO, Yasuhisa
Published in Journal of physics. Condensed matter (2011)
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Published in Journal of physics. Condensed matter (2011)
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Pit Formation, Patterning and Flattening of Ge Surfaces in O 2 -Containing Water by Metal-Assisted Chemical Etching
Kawase, Tatsuya, Mura, Atsushi, Saito, Yusuke, Okamoto, Takeshi, Kawai, Kentaro, Sano, Yasuhisa, Yamauchi, Kazuto, Morita, Mizuho, Arima, Kenta
Published in ECS transactions (19.08.2016)
Published in ECS transactions (19.08.2016)
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PROCESSING METHOD, COMBINED PROCESSING DEVICE ACCORDING TO THE SAME, AND PRODUCT SUBJECTED TO PROCESSING THEREBY
OYAMA KOKI, AIDA HIDEO, DOI TOSHIRO, SANO YASUHISA, MIYASHITA CHUICHI
Year of Publication 08.10.2015
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Year of Publication 08.10.2015
Patent
Catalyst-Assisted Electroless Flattening of Ge Surfaces in Dissolved-O sub(2)-Containing Water
Kawase, Tatsuya, Saito, Yusuke, Mura, Atsushi, Okamoto, Takeshi, Kawai, Kentaro, Sano, Yasuhisa, Morita, Mizuho, Yamauchi, Kazuto, Arima, Kenta
Published in ChemElectroChem (01.11.2015)
Published in ChemElectroChem (01.11.2015)
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PROCESSING METHOD, PROCESSING DEVICE, AND PRODUCT PRODUCED THEREBY
OYAMA KOKI, AIDA HIDEO, DOI TOSHIRO, SANO YASUHISA, MIYASHITA CHUICHI
Year of Publication 03.09.2015
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Year of Publication 03.09.2015
Patent
Wavefield characterization of nearly diffraction-limited focused hard x-ray beam with size less than 10 nm
Kimura, Takashi, Mimura, Hidekazu, Handa, Soichiro, Yumoto, Hirokatsu, Yokoyama, Hikaru, Imai, Shota, Matsuyama, Satoshi, Sano, Yasuhisa, Tamasaku, Kenji, Komura, Yoshiki, Nishino, Yoshinori, Yabashi, Makina, Ishikawa, Tetsuya, Yamauchi, Kazuto
Published in Review of scientific instruments (01.12.2010)
Published in Review of scientific instruments (01.12.2010)
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Extended knife-edge method for characterizing sub-10-nm X-ray beams
Handa, Soichiro, Kimura, Takashi, Mimura, Hidekazu, Yumoto, Hirokatsu, Matsuyama, Satoshi, Sano, Yasuhisa, Tamasaku, Kenji, Nishino, Yoshinori, Yabashi, Makina, Ishikawa, Tetsuya, Yamauchi, Kazuto
Published in Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment (01.05.2010)
Published in Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment (01.05.2010)
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Breaking the 10 nm barrier in hard-X-ray focusing
Mimura, Hidekazu, Handa, Soichiro, Kimura, Takashi, Yumoto, Hirokatsu, Yamakawa, Daisuke, Yokoyama, Hikaru, Matsuyama, Satoshi, Inagaki, Kouji, Yamamura, Kazuya, Sano, Yasuhisa, Tamasaku, Kenji, Nishino, Yoshinori, Yabashi, Makina, Ishikawa, Tetsuya, Yamauchi, Kazuto
Published in Nature geoscience (01.06.2010)
Published in Nature geoscience (01.06.2010)
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Journal Article
POLISHING TOOL AND POLISHING APPARATUS
YAMAUCHI KAZUTO, YAGI KEITA, SANO YASUHISA, OKAMOTO TAKESHI, MURATA JUNJI, SADAKUNI SHUN
Year of Publication 04.01.2017
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Year of Publication 04.01.2017
Patent
PLASMA GENERATION DEVICE
YASUTAKE KIYOSHI, YAMAMURA KAZUYA, NISHIOKA YOSUKE, HONJO TOMOIKU, SANO YASUHISA, MIYAZAKI SHIRO
Year of Publication 13.10.2016
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Year of Publication 13.10.2016
Patent
Consideration of Femtosecond Laser-Induced Effect on Semiconductor Material SiC Substrate for CMP Processing
Aida, Hideo, Eiji, Asakawa, Wang, Cheng Wu, Hayashi, Terutake, Zhang, Ji, Uneda, Michio, Kurokawa, Syuhei, Sano, Yasuhisa, Ohyama, Koki, Ohnishi, Osamu, Doi, Toshiro
Published in Applied mechanics and materials (19.10.2015)
Published in Applied mechanics and materials (19.10.2015)
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Efficient wet etching of GaN (0001) substrate with subsurface damage layer
Sadakuni, Shun, Murata, Junji, Yagi, Keita, Sano, Yasuhisa, Okamoto, Takeshi, Kenta, Arima, Hattori, Azusa N, Yamauchi, Kazuto
Published in Journal of nanoscience and nanotechnology (01.04.2011)
Published in Journal of nanoscience and nanotechnology (01.04.2011)
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Wavefront Control System for Phase Compensation in Hard X-ray Optics
Kimura, Takashi, Handa, Soichiro, Mimura, Hidekazu, Yumoto, Hirokatsu, Yamakawa, Daisuke, Matsuyama, Satoshi, Inagaki, Kouji, Sano, Yasuhisa, Tamasaku, Kenji, Nishino, Yoshinori, Yabashi, Makina, Ishikawa, Tetsuya, Yamauchi, Kazuto
Published in Japanese Journal of Applied Physics (01.07.2009)
Published in Japanese Journal of Applied Physics (01.07.2009)
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Dependence of GaN Removal Rate of Plasma Chemical Vaporization Machining on Mechanically Introduced Damage
Published in Sensors and materials
(2014)
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Journal Article
FLATTENING METHOD AND FLATTENING DEVICE OF Si SUBSTRATE
ISOHASHI AI, YAMAUCHI KAZUTO, SANO YASUHISA, SUZUKI TATSUTOSHI, SUZUKI DAISUKE
Year of Publication 07.09.2015
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Year of Publication 07.09.2015
Patent