Acid Dissociation Constant of Bis(2-Ethylhexyl) Hydrogen Phosphate Impregnated in a Polymer Layer Coated on Silica Microparticles
Miyagawa, Akihisa, Takeuchi, Masayuki, Arai, Tsuyoshi, Watanabe, Sou, Sano, Yuichi, Nakatani, Kiyoharu
Published in Bulletin of the Chemical Society of Japan (15.04.2022)
Published in Bulletin of the Chemical Society of Japan (15.04.2022)
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Competitive Distribution of Europium and Samarium Based on Reaction Rate-Limiting Process in Nitrilotriacetamide Extractant-Impregnated Polymer-Coated Silica Particles
Miyagawa, Akihisa, Hayashi, Naoki, Iwamoto, Hibiki, Arai, Tsuyoshi, Nagatomo, Shigenori, Miyazaki, Yasunori, Hasegawa, Kenta, Sano, Yuichi, Nakatani, Kiyoharu
Published in Bulletin of the Chemical Society of Japan (15.09.2023)
Published in Bulletin of the Chemical Society of Japan (15.09.2023)
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Development of a process for the separation of MA(III) from Ln(III) fission products using HONTA impregnated adsorbent
Kubota, Masahiko, Kim, Seong-Yun, Wu, Hao, Watanabe, Sou, Sano, Yuichi, Takeuchi, Masayuki, Arai, Tsuyoshi
Published in Journal of radioanalytical and nuclear chemistry (01.05.2024)
Published in Journal of radioanalytical and nuclear chemistry (01.05.2024)
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Kinetic Mass Transfer Behavior of Eu(III) in Nitrilotriacetamide-Impregnated Polymer-Coated Silica Particles
Miyagawa, Akihisa, Hayashi, Naoki, Kuzure, Yoshiaki, Takahashi, Takumi, Iwamoto, Hibiki, Arai, Tsuyoshi, Nagatomo, Shigenori, Miyazaki, Yasunori, Hasegawa, Kenta, Sano, Yuichi, Nakatani, Kiyoharu
Published in Bulletin of the Chemical Society of Japan (15.07.2023)
Published in Bulletin of the Chemical Society of Japan (15.07.2023)
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Dependences of the hole mobility in the strained Si pMOSFET and gated Hall bars formed on SiGe/Si(110) on the channel direction and the strained Si thickness
Arimoto, Keisuke, Fujisawa, Taisuke, Namiuchi, Daichi, Onogawa, Atsushi, Sano, Yuichi, Izumi, Daisuke, Yamanaka, Junji, Hara, Kosuke O., Sawano, Kentarou, Nakagawa, Kiyokazu
Published in Journal of crystal growth (01.10.2021)
Published in Journal of crystal growth (01.10.2021)
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Evaluation of Lattice-Spacing of SiGe/Si by NBD using Two-condenser-lens TEM
Yamanaka, Junji, Oguni, Takuya, Sano, Yuichi, Ohshima, Yusuke, Onogawa, Atsushi, Hara, Kosuke O., Arimoto, Keisuke
Published in Microscopy and microanalysis (01.08.2022)
Published in Microscopy and microanalysis (01.08.2022)
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Overview of development program for engineering scale extraction chromatography MA(III) recovery system
WATANABE, Sou, TAKAHATAKE, Youko, HASEGAWA, Kenta, GOTO, Ichiro, MIYAZAKI, Yasunori, WATANABE, Masayuki, SANO, Yuichi, TAKEUCHI, Masayuki
Published in Mechanical Engineering Journal (01.01.2024)
Published in Mechanical Engineering Journal (01.01.2024)
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Extraction Mechanism of Lanthanide Ions into Silica-based Microparticles Studied by Single Microparticle Manipulation and Microspectroscopy
OTAKA, Toshiki, SATO, Tatsumi, ONO, Simpei, NAGOSHI, Kohei, ABE, Ryoji, ARAI, Tsuyoshi, WATANABE, Sou, SANO, Yuichi, TAKEUCHI, Masayuki, NAKATANI, Kiyoharu
Published in Analytical Sciences (10.10.2019)
Published in Analytical Sciences (10.10.2019)
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Influences of lattice strain and SiGe buffer layer thickness on electrical characteristics of strained Si/SiGe/Si(110) heterostructures
Fujisawa, Taisuke, Onogawa, Atsushi, Horiuchi, Miki, Sano, Yuichi, Sakata, Chihiro, Yamanaka, Junji, Hara, Kosuke O., Sawano, Kentarou, Nakagawa, Kiyokazu, Arimoto, Keisuke
Published in Materials science in semiconductor processing (01.07.2023)
Published in Materials science in semiconductor processing (01.07.2023)
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Strain relaxation process and evolution of crystalline morphologies during the growths of SiGe on Si(110) by solid-source molecular beam epitaxy
Saito, Shingo, Sano, Yuichi, Yamada, Takane, Hara, Kosuke O., Yamanaka, Junji, Nakagawa, Kiyokazu, Arimoto, Keisuke
Published in Materials science in semiconductor processing (01.07.2020)
Published in Materials science in semiconductor processing (01.07.2020)
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Journal Article
Stability of strain in Si layers formed on SiGe/Si(110) heterostructures
Arimoto, Keisuke, Onogawa, Atsushi, Saito, Shingo, Yamada, Takane, Sato, Kei, Utsuyama, Naoto, Sano, Yuichi, Izumi, Daisuke, Yamanaka, Junji, Hara, Kosuke O, Sawano, Kentarou, Nakagawa, Kiyokazu
Published in Semiconductor science and technology (15.11.2018)
Published in Semiconductor science and technology (15.11.2018)
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Journal Article
Hole mobility in Strained Si/Relaxed SiGe/Si(110) hetero structures studied by gated Hall measurements
Namiuchi, Daichi, Onogawa, Atsushi, Fujisawa, Taisuke, Sano, Yuichi, Izumi, Daisuke, Yamanaka, Junji, Hara, Kosuke O., Sawano, Kentarou, Nakagawa, Kiyokazu, Arimoto, Keisuke
Published in Materials science in semiconductor processing (01.07.2020)
Published in Materials science in semiconductor processing (01.07.2020)
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Journal Article
Relaxation of Strain in Si Layers Formed on (110)-Oriented SiGe/Si Heterostructures
Arimoto, Keisuke, Onogawa, Atsushi, Saito, Shingo, Sano, Yuichi, Izumi, Daisuke, Yamanaka, Junji, Hara, Kosuke O, Nakagawa, Kiyokazu
Published in ECS transactions (22.10.2019)
Published in ECS transactions (22.10.2019)
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Solution properties of amylose tris(n-butylcarbamate). Helical and global conformation in alcohols
Sano, Yuichi, Terao, Ken, Arakawa, Shota, Ohtoh, Masahiro, Kitamura, Shinichi, Norisuye, Takashi
Published in Polymer (Guilford) (01.08.2010)
Published in Polymer (Guilford) (01.08.2010)
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Comparison of lumbar drainage and external ventricular drainage for clearance of subarachnoid clots after Guglielmi detachable coil embolization for aneurysmal subarachnoid hemorrhage
Maeda, Yoshihiko, Shirao, Satoshi, Yoneda, Hiroshi, Ishihara, Hideyuki, Shinoyama, Mizuya, Oka, Fumiaki, Sadahiro, Hirokazu, Ueda, Katsuhiko, Sano, Yuichi, Kudomi, Shohei, Hayashi, Yukari, Shigeeda, Tomoko, Nakano, Kaori, Koizumi, Hiroyasu, Nomura, Sadahiro, Fujii, Masami, Suzuki, Michiyasu
Published in Clinical neurology and neurosurgery (01.07.2013)
Published in Clinical neurology and neurosurgery (01.07.2013)
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