Enlargement of poly-Si film grain size by excimer laser annealing and its application to high-performance poly-Si thin film transistor
KURIYAMA, H, KIYAMA, S, TSUDA, S, NAKANO, S, KUWANO, Y, NOGUCHI, S, KUWAHARA, T, ISHIDA, S, NOHDA, T, SANO, K, IWATA, H, KAWATA, H, OSUMI, M
Published in Japanese Journal of Applied Physics (01.12.1991)
Published in Japanese Journal of Applied Physics (01.12.1991)
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