Improved Uniformity of Photoresist Ashing for a Half-Inch Wafer with Double U-shaped Antenna Structure in a Microwave-Excited Water Vapor Plasma
Aizawa, Takeshi, Shimada, Taishin, Sakurai, Tasuku, Nakano, Yusuke, Tanaka, Yasunori, Uesugi, Yoshihiko, Ishijima, Tatsuo
Published in Journal of Photopolymer Science and Technology (01.01.2021)
Published in Journal of Photopolymer Science and Technology (01.01.2021)
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Journal Article
High Speed Ashing of Ion Implanted Photoresist by Microwave Excited Water Vapor Plasma with Powered Substrate
Aizawa, Takeshi, Sakurai, Tasuku, Paing, Khant Nyar, Kayamori, Yusuke, Nakano, Yusuke, Tanaka, Yasunori, Ishijima, Tatsuo
Published in Journal of Photopolymer Science and Technology (2022)
Published in Journal of Photopolymer Science and Technology (2022)
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Journal Article
Investigation of Pressure Dependence in Photoresist Ashing Process using Microwave Excited Water Vapor Plasma
Paing, Khant Nyar, Aizawa, Takeshi, Nishioka, Hiroto, Yamamoto, Masashi, Sakurai, Tasuku, Erdenezaya, Bat-Orgil, Kayamori, Yusuke, Nakano, Yusuke, Tanaka, Yasunori, Ishijima, Tatsuo
Published in Journal of Photopolymer Science and Technology (16.12.2022)
Published in Journal of Photopolymer Science and Technology (16.12.2022)
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Journal Article
Improved Uniformity of Photoresist Ashing for a Half-Inch Wafer with Double U-shaped Antenna Structure in a Microwave-Excited Water Vapor Plasma
Aizawa, Takeshi, Shimada, Taishin, Sakurai, Tasuku, Nakano, Yusuke, Tanaka, Yasunori, Uesugi, Yoshihiko, Ishijima, Tatsuo
Published in Journal of photopolymer science and technology (01.09.2021)
Published in Journal of photopolymer science and technology (01.09.2021)
Get full text
Journal Article