Technique for transfer of high-density, high-aspect-ratio nanoscale patterns in UV nanoimprint lithography and measurement of the release force
Taniguchi, Jun, Kamiya, Yasuhiro, Ohsaki, Takeshi, Sakai, Nobuji
Published in Microelectronic engineering (01.05.2010)
Published in Microelectronic engineering (01.05.2010)
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Journal Article
Conference Proceeding
Fluorescent UV-Curable Resists for UV Nanoimprint Lithography
Kobayashi, Kei, Sakai, Nobuji, Matsui, Shinji, Nakagawa, Masaru
Published in Japanese Journal of Applied Physics (01.06.2010)
Published in Japanese Journal of Applied Physics (01.06.2010)
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Journal Article
Evaluation of Curing Characteristics in UV-NIL Resist
Suzuki, Ryosuke, Sakai, Nobuji, Sekiguchi, Atsushi, Matsumoto, Yoko, Tanaka, Risa, Hirai, Yoshihiko
Published in Journal of Photopolymer Science and Technology (01.01.2010)
Published in Journal of Photopolymer Science and Technology (01.01.2010)
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Journal Article
Study on Curing Characteristic of UV Nanoimprint Resist
Suzuki, Ryusuke, Sakai, Nobuji, Ohsaki, Takeshi, Sekiguchi, Atsushi, Kawata, Hiroyuki, Hirai, Yoshihiko
Published in Journal of Photopolymer Science and Technology (01.01.2012)
Published in Journal of Photopolymer Science and Technology (01.01.2012)
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Journal Article
Filling behavior of UV nanoimprint resin observed by using a midair structure mold
Taniguchi, Jun, Machinaga, Ken-ichi, Unno, Noriyuki, Sakai, Nobuji
Published in Microelectronic engineering (01.04.2009)
Published in Microelectronic engineering (01.04.2009)
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Journal Article
Conference Proceeding
Evaluation of filling behavior on UV nanoimprint lithography using release coating
Osari, Kazutomo, Unno, Noriyuki, Taniguchi, Jun, Machinaga, Ken-ichi, Ohsaki, Takeshi, Sakai, Nobuji
Published in Microelectronic engineering (01.05.2010)
Published in Microelectronic engineering (01.05.2010)
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Journal Article
Conference Proceeding
Release Properties and Durability of Release Layer on UV Nanoimprint Lithography
Taniguchi, Jun, Kamiya, Yasuhiro, Ohsaki, Takeshi, Sakai, Nobuji
Published in Journal of Photopolymer Science and Technology (01.01.2009)
Published in Journal of Photopolymer Science and Technology (01.01.2009)
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Journal Article
Photo-curable resins and evaluation methods for UV-nanoimprint lithography
Hirasawa, Tamao, Taniguchi, Jun, Ohtaguchi, Makoto, Sakai, Nobuji
Published in Electronics and communications in Japan (01.11.2009)
Published in Electronics and communications in Japan (01.11.2009)
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Journal Article
Measurement of Adhesive Force Between Mold and Photocurable Resin in Imprint Technology
Taniguchi, Jun, Kawasaki, Takeshi, Tokano, Yuji, Kogo, Yasuo, Miyamoto, Iwao, Komuro, Masanori, Hiroshima, Hiroshi, Sakai, Nobuji, Tada, Kentaro
Published in Japanese Journal of Applied Physics (2002)
Published in Japanese Journal of Applied Physics (2002)
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Journal Article
UV Nanoimprint Lithography and Its Application for Nanodevices
Fukuhara, Makoto, Ono, Hiroshi, Hirasawa, Tamano, Otaguchi, Makoto, Sakai, Nobuji, Mizuno, Jun, Shoji, Shuichi
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
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Journal Article
Filling Behavior Observation on UV Nanoimprint Lithography
Unno, Noriyuki, Osari, Kazutomo, Machinaga, Ken-ichi, Taniguchi, Jun, Ohsaki, Takeshi, Sakai, Nobuji
Published in Journal of Photopolymer Science and Technology (01.01.2009)
Published in Journal of Photopolymer Science and Technology (01.01.2009)
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Journal Article